Ciba-geigy Corporation

Edward Irving

Christopher P Banks

Terence J Smith

Christopher G Demmer

George E Green

Alfred Renner

Kevin B Hatton

Jonathan W Goodin

Josephine M Walshe

Anne Mallaband

Beat Muller

Adrian Schulthess

Max Hunziker

Christopher M Andrews

John S Waterhouse

Ewald Losert

Bernard Peter Stark

Robert J Lunn

Christian Vonlanthen

David A Taylor

Roderick D Hathaway

John P Innocenzi

Alan H Haines

Jane Wilkerson

The present invention provides a process for preparing a sulphoxonium salt from the corresponding sulphonium salt which comprises oxidising the sulphonium salt using a peracid, under basic conditions, in a solvent other than a ketone. Some of the sulphoxonium salts are new compounds.

Preparation of sulphoxonium salts

A data-carrying laminate such as a credit card or identity card comprises a sheet of cellulosic material or synthetic material and a thermoplastic polymeric film, at least one of said sheet and said thermoplastic film carrying data, said sheet and said thermoplastic film being bonded together by a cured adhesive layer obtained by curing a solid film adhesive comprising (A) a solid polymer of a vinyl carboxylic acid and (B) a curable material having at least one acrylate or methacrylate group.

Data carrying laminate

A security card comprises a data-carrying sheet having a gelatin layer thereon and a transparent polymeric film having a gelatin layer thereon, said sheet and said film being bonded together by an adhesive composition polymerized between and in contact with the gelatin layers, the adhesive composition comprising a carboxylic acid having at least one polymerizable acrylic group.

Security cards

Images are formed by the following process:

Method for forming images

The present invention provides a method for making a metallic pattern on a substrate having a surface comprising bare metal in predetermined areas and metal coated by a resist in remaining areas which comprises (i) protecting the bare metal by coating with a film-forming resin, (ii) removing any film-forming resin from the resist, (iii) removing the resist from said remaining areas using a solvent which will not remove the film-forming resin, thereby exposing metal in said remaining areas, (iv) etching the metal exposed in (iii) using an etchant which does not remove the film-forming resin and (v) removing the film-forming resin with a suitable solvent.

Method for making metallic patterns

Monethylenically unsaturated compounds whose polymers are useful as polymeric photoinitiators are of formula Ar.sup.1 COC(R.sup.1)(R.sup.2)R.sup.3 where R.sup.1 is C.sub.1 -C.sub.10 alkyl or alkoxy, R.sup.2 is C.sub.1 -C.sub.10 alkyl, --X--O--R.sup.4 --OCOC(R.sup.5).dbd.CH.sub.2 (II) --X--NH--R.sup.6 --OCOC(R.sup.5).dbd.CH.sub.2 (III), or --CH.sub.2 [OCH.sub.2 CH(OH)CH.sub.2 ].sub.a OCOC(R.sup.5).dbd.CH.sub.2 (IIIA) or R.sup.1 and R.sup.2, together with the attached carbon, denote C.sub.4 -C.sub.8 cycloalkyl, R.sup.3 is a C.sub.6 -C.sub.20 aromatic group, OH, tert.amino, --OCOC(R.sup.5).dbd.CH.sub.2 (VI) or --OCH.sub.2 CH(OH)CH.sub.2 OCOC(R.sup.5).dbd.CH.sub.2 (VIA), R.sup.4 is C.sub.1 -C.sub.4 alkylene, which may be substituted by --OH or by C.sub.2 -C.sub.20 acyloxy, R.sup.5 is H or C.sub.1 -C.sub.4 alkyl, R.sup.6 is C.sub.1 to C.sub.4 alkylene, X is a group of formula R.sup.7 CO-- or ##STR1## where R.sup.7 is C.sub.1 -C.sub.4 alkylene, R.sup.8 is C.sub.1 to C.sub.4 alkyl, and is 0 or 1, Ar.sup.1 is a C.sub.6 -C.sub.20 aromatic group, with the provisos that (i) R.sup.2, R.sup.3 or Ar.sup.1 contains a group (VI), (ii) where R.sup.1 and R.sup.2 together with the attached carbon atom denote cycloalkyl, R.sup.3 is --OH, tert.amino or a group VI or VIA (iii) when R.sup.2 is a group II, a is 0, (iv) when R.sup.2 is a group III a is 1, (v) when R.sup.2 denotes a group IIIA, R.sup.3 denotes said monovalent aromatic group (vi) when R.sup.3 denotes a group VI, R.sup.1 and R.sup.2 together with the attached carbon denote C.sub.4 -C.sub.8 cycloalkyl, (vii) when Ar.sup.1 contains a group VI R.sup.1 is --CH.sub.3 and R.sup.3 is --OH, R.sup.2 is C.sub.2 -C.sub.10 alkyl, and (viii) when Ar.sup.1 contains a group VI, R.sup.1 and R.sup.2 are each alkyl and R.sup.3 is --OH, the group VI is linked to an aromatic C atom in Ar.sup.1 through a group --YR.sup.10 OR.sup.9 -- or --YR.sup.10 OCONHR.sup.6 --, Y being attached to an aromatic C atom, where Y is O or S, R.sup.9 is 2-hydroxypropylene or 2-(C.sub.2 -C.sub.20 acyloxy)propylene and R.sup.10 is C.sub.1 -C.sub.4 alkylene.

Monoethylenically unsaturated compounds whose polymers are useful as

A method of making a pattern on an electrically conductive material such as a printed circuit comprises

Method of making electrically conductive patterns

A process for the formation of an image comprises

Process for the formation of positive images utilizing electrodeposition

Imides of the formula I ##STR1## In which R.sub.1, R.sub.2 and R.sub.4 independently of one another are hydrogen or methyl, R.sub.3 is a direct bond or a C.sub.2 -C.sub.20 aliphatic radical which can be interrupted by O atoms or a mononuclear or polynuclear C.sub.5 -C.sub.20 cycloaliphatic or C.sub.6 -C.sub.20 aromatic radical or is a group of the formula II ##STR2## in which T is methylene, isopropylidene, CO, O, S or SO.sub.2 and R.sub.5 is hydrogen or phenyl, can be crosslinked either photochemically or by heat and produce polymers having excellent properties, in particular a very high resistance to heat. They are particularly suitable for the production of heat-resistant photolithographs or as matrix resins for the production of composite materials.

Substituted, unsaturated, bireactive bicycle imides and the use thereof

Metallic patterns, such as printed circuits, are prepared by immersing metal substrates, bearing electrodeposited films and resist films in patterned areas, into an aqueous solution or dispersion of a hardening agent so that the hardening agent diffuses only into the electrodeposited film. This is followed by curing the hardening agent by heat or irradiation to render it resistant to the solvent used to remove the resist film and to the etchant solution for the metal exposed when the resist film is removed.

Method of making a metallic pattern on a substrate

A method of making a pattern of an electrically conductive material which comprises

Method of making a pattern

Process for the formation of an image

Process for forming images

Monoethylenically unsaturated compounds whose polymers are useful as polymeric photoinitiators are of formula Ar.sup.1 COC(R.sup.1)(R.sup.2)R.sup.3 where R.sup.1 is (C.sub.1 -C.sub.10 alkyl or alkoxy, R.sup.2 is C.sub.1 -C.sub.10 alkyl, --X--O--R.sup.4 -OCOC(R.sup.5).dbd.CH.sub.2 (II) --X--NH--R.sup.6 --OCOC(R.sup.5).dbd.CH.sub.2 (III), or --CH.sub.2 [OCH.sub.2 CH(OH)CH.sub.2 ].sub.a OCOC(R.sup.5).dbd.CH.sub.2 (IIIA) or R.sup.1 and R.sup.2, together with the attached carbon, denote C.sub.4 -C.sub.8 cycloalkyl, R.sup.3 is a C.sub.6 -C.sub.20 aromatic group, OH tert. amino,--OCOC(R.sup.5).dbd.CH.sub.2 (VI) or --OCH.sub.2 CH(OH)CH.sub.2 OCOC(R.sup.5).dbd.CH.sub.2 (VIA), R.sup.4 is C.sub.1 14 C.sub.4 alkylene, which may be substituted by --OH or by C.sub.2 -C.sub.20 acyloxy, R.sup.5 is H or C.sub.1 -C.sub.4 alkyl, R.sup.6 is C.sub.1 to C.sub.4 alkylene, X is a group of formula R.sup.7 CO-- or ##STR1## where R.sup.7 is C.sub.1 -C.sub.4 alkylene, R.sup.8 is C.sub.1 to C.sub.4 alkyl, and is 0 or 1, Ar.sup.1 is a C.sub.6 -C.sub.20 aromatic group, with the provisos that (i) R.sup.2, R.sup.3 or Ar.sup.1 contains a group (VI), (ii) where R.sup.1 and R.sup.2 together with the attached carbon atom denote cycloalkyl, R.sup.3 is --OH, tert.amino or a group VI or VIA (iii) when R.sup.2 is a group II, a is 0, (iv) when R.sup.2 is a group III a is 1, (v) when R.sup.2 denotes a group IIIA, R.sup.3 denotes said monovalent aromatic group (vi) when R.sup.3 denotes a group VI, R.sup.1 and R.sup.2 together with the attached carbon denote C.sub.4 -C.sub.8 cycloalkyl, (vii) when Ar.sup.1 contains a group VI R.sup.1 is --CH.sub.3 and R.sup.3 is --OH, R.sup.2 is C.sub.2 -C.sub.10 alkyl, and (viii) when Ar.sup.1 contains a group VI, R.sup.1 and R.sup.2 are each alkyl and R.sup.3 is --OH, the group VI is linked to an aromatic C atom in Ar.sup.1 through a group --YR.sup.10 OR.sup.9 -- or --YR.sup.10 OCONHR.sup.6 --, Y being attached to an aromatic C atom, where Y is O or S, R.sup.9 is 2-hydroxypropylene or 2-(C.sub.2 -C.sub.20 acyloxy)-propylene and R.sup.10 is C.sub.1 -C.sub.4 alkylene.

Monoethylenically unsaturated compounds

A polymerizable composition comprises a mixture of

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Burwell, United Kingdom

Edward Irving