International Business Machines Corporation

Edward Gipstein

Wayne Martin Moreau

Omar U Need, Iii

Hiroyuki Hiraoka

Charles A Cortellino

Duane E Johnson

Joachim Bargon

William A Hewett

A positive resist image is produced by exposure of a layer of non-crosslinked polymeric material to high energy radiation in a predetermined pattern, the polymeric material containing alkyl methacrylate units and polymerized units of certain other ethylenically unsaturated monomers, followed by removal of the electron degraded material from the exposed areas.

Preparation of resist image with methacrylate polymers

It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 .times. 10.sup..sup.-6 coulombs/cm.sup.2.

Positive polymeric electron beam resists of very great sensitivity

Very sensitive electron beam positive resists have been obtained using films of nitrocellulose containing 10.5 to 12% nitrogen.

Use of nitrocellulose containing 10.5 to 12% nitrogen as electron beam

A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.

Positive resists containing dimethylglutarimide units

Electron beam positive resists which are sensitive to electron beam radiation and simultaneously thermally stable are prepared using polycarbonates.

Thermally stable positive polycarbonate electron beam resists

Very sensitive electron beam positive resists have been obtained using films of polymeric methyl methacrylate containing acetate polymers.

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Saratoga, CA, United States of America

Edward Gipstein