Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno

Technische Universiteit

Edward Aloys Gerard Hamers

Mauritius Cornelius Maria Van De Sanden

Joannes Leonard Linden

Mauritius Cornelis Maria Van De Sanden

Daniel C Schram

Gregory Robert Alcott

Arno Hendrikus Marie Smets

The present invention describes a method for applying a hybrid coating to a substrate. A coating according to the invention is formed by an inorganic component and an organic component. As a result, this coating has the hybrid character whereby the advantages of inter alia hardness are combined with flexibility. The invention also describes a device for the manufacture of a hybrid coating.

Method for depositing inorganic/organic films

In a process and device for depositing an at least partially crystalline silicon layer a plasma is generated and a substrate () is exposed under the influence of the plasma to a silicon-containing source fluid for deposition of silicon therefrom. A pressure drop is applied between a location () where the source fluid is supplied and the substrate (). In addition to the source fluid an auxiliary fluid is also injected which is able to etch non-crystalline silicon atoms. The substrate () is exposed to both the source fluid and the auxiliary fluid.

Process and device for the deposition of an at least partially crystalline silicium layer on a substrate

Growing community of inventors

Eindhoven, Netherlands

Edward Aloys Gerard Hamers