Hitachi Global Storage Technologies Netherlands B.v.

Western Digital Technologies, Inc.

Eduardo Torres Mireles

Cherngye Hwang

Jila Tabib

Eric Wayne Flint

Yongjian Sun

Nobuto Yasui

Mineaki Kodama

Jorge Goitia

Kazuhito Miyata

Peter Dang

Charanjit S Bhatia

Takefumi Kubota

Dorcas Gazelle Lagasca Flavier

Marlon Estrella Tecson

In one embodiment, a method includes forming a structure having a first region including a ceramic material, a second region including a plurality of particles disposed in a ceramic matrix material, and a magnetic head assembly disposed in the first region. The method also includes directing a first ion beam at a side of the first and second regions of the structure, the first ion beam including an oxidizing species to oxidize one or more portions of the particles located near the side of the second region, where the one or more oxidized portions of the particles protrude from the side of the ceramic matrix material of the second region. The method further includes directing a second ion beam at the side of the first and second regions of the structure, the second ion beam including an inert species to recess the first and second regions.

Surface treatment of magnetic recording heads for improving the robustness thereof

A hard disk drive slider comprises an overcoat layer, which covers an air-bearing surface of the slider. The overcoat covers an exposed surface of a tunneling magnetoresistance transducer. An adhesion layer is coupled with the overcoat layer and the air-bearing surface. The adhesion layer comprises a compound of nitrogen. The compound of nitrogen reduces noise in read data from the tunneling magnetoresistance transducer.

Slider overcoat for noise reduction of TMR magnetic transducer

A shaper for shaping an ion beam and that can be used for both deposition and etching is described. The shaper includes a plate that is placed between an ion beam grid and an ion beam source. The plate covers holes in the grid, and is shaped and dimensioned such that the plate does not partially cover any holes in the grid that are directly adjacent to the plate. A hole is configured to mount the shaper at a center of the grid and at least one other hole is configured to secure the shaper to the grid to prevent the shaper from rotating relative to the grid. A center mount portion covers holes in the grid. The plate has two axes of reflection symmetry. The uniformity of both deposition and etching is improved.

Symmetrical shaper for an ion beam deposition and etching apparatus

Growing community of inventors

Guadalajara, Mexico

Eduardo Torres Mireles