Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Edgar Osorio

Dirk Heinrich Ehm

Stefan-Wolfgang Schmidt

Edwin Te Sligte

Mark Zellenrath

Hella Logtenberg

An EUV lithography system () includes: at least one optical element () having an optical surface () arranged in a vacuum environment () of the EUV lithography system (), and a feed device () for feeding hydrogen into the vacuum environment (), in which at least one silicon-containing surface () is arranged. The feed device () additionally feeds an oxygen-containing gas into the vacuum environment () and has a metering device () that sets an oxygen partial pressure (p) at the at least one silicon-containing surface () and/or at the optical surface ().

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Veldhoven, Netherlands

Edgar Osorio