Applied Materials, Inc.

Eddie Feigel

Joseph Michael Ranish

Paul Brillhart

Daniel Redfield

Satheesh Kuppurao

Balasubramanian Ramachandran

Kin Pong Lo

Kailash Kiran Patalay

James Francis Mack

Michael Olsen

Richard Halpin

Brett Vetorino

Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.

Absorbing reflector for semiconductor processing chamber

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Forest Grove, OR, United States of America

Eddie Feigel