Cymer, Inc.

Ed Danielewicz

William N Partlo

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Richard L Sandstrom

Daniel J W Brown

Robert N Jacques

Robert A Bergstedt

Vladimir B Fleurov

Rajasekhar Rao

German E Rylov

Christian J Wittak

John Fitzgerald

Robin Swain

Edward Arriola

Michael Wyatt

Walter Crosby

An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.

Immersion lithography laser light source with pulse stretcher

Growing community of inventors

Carlsbad, CA, United States of America

Ed Danielewicz