Taiwan Semiconductor Manufacturing Comp. Ltd.

Eason Chen

Jiun-Rong Pai

Yang-Ann Chu

Yi-Fam Shiu

Hsu-Shui Liu

Sung-Chun Yang

Tsung-Sheng Kuo

A cleaning apparatus, method, and dry chamber are provided for cleaning a wafer carrier that holds wafers as part of a semiconductor fabrication process. The cleaning apparatus includes a wet chamber that receives the wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores a cleaning liquid that is introduced to the wafer carrier within the wet chamber during a washing operation, and a dry chamber is spaced apart from the wet chamber. The dry chamber receives the wafer carrier after the wafer carrier is washed in the wet chamber and holds the wafer carrier during a drying operation. A transport system transports the wafer carrier between the wet chamber and the dry chamber during a cleaning process.

Semiconductor arrangement and method for making

In an embodiment, a system includes: a tool port of a semiconductor processing tool; a processing port with an internal processing port location and an external processing port location; a robot configured to move a die vessel between the internal processing port location and the tool port; and an actuator configured to move the die vessel between the internal processing port location and the external processing port location.

Systems and methods for automated processing ports

Growing community of inventors

Hemei, Taiwan

Eason Chen