Asml Netherlands B.v.

Cymer, Inc.

Dzmitry Labetski

Hendrikus Gijsbertus Schimmel

Gerardus Hubertus Petrus Maria Swinkels

Erik Roelof Loopstra

Vadim Yevgenyevich Banine

Tjarko Adriaan Rudolf Van Empel

Yuri Johannes Gabriël Van De Vijver

Jan Bernard Plechelmus Van Schoot

Andrew David LaForge

Yue Ma

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Johannes Hubertus Josephina Moors

Johan Frederik Dijksman

Chunguang Xia

Vladimir Vitalevich Ivanov

Christianus Wilhelmus Johannes Berendsen

Ramin Badie

Henricus Gerardus Tegenbosch

Klaus Martin Hummler

Nicolaas Ten Kate

Hans Jansen

Michel Riepen

Reinier Theodorus Martinus Jilisen

William N Partlo

Uwe Stamm

Johannes Christiaan Leonardus Franken

Henricus Jozef Castelijns

Richard Joseph Bruls

Andrei Mikhailovich Yakunin

Vladimir Vitalevitch Ivanov

Kerim Nadir

Marc Guy Langlois

Kornelis Frits Feenstra

Arun Johnkadaksham

Matthias Kraushaar

Maksim Loginov

Seyedmohammad Mojab

Alexander Shatalov

Wilbert Jan Mestrom

Albert Pieter Rijpma

Jacob Brinkert

John Tom Stewart

Peter Van Putten

Dennis Jozef Maria Paulussen

Jan Okke Nieuwenkamp

Wim Ronald Kampinga

Gerrit Van Der Straaten

Brian Vernon Virgo

Vladimir Mikhailovich Krivtsun

Antonius Theodorus Wilhelmus Kempen

Tom Van Zutphen

Ronald Johannes Hultermans

John Tom Stewart, Iv

Marc Antonius Maria Haast

Peter Gerardus Jonkers

Uwe Bruno Heini Stamm

Cristian Bogdan Craus

Sven Pekelder

Rui Miguel Duarte Rodrigues Nunes

Sander Baltussen

Christian Felix Wählisch

Wendelin Johanna Maria Versteeg

Chuangxin Zhao

Jan Groenewold

Gerardus Swinkels

Roel Moors

Rui Miguel Duarte Rodreigues Nunes

Rui Miguel Duarte Rodriges Nunes

Pär Mårten Lukas Broman

Yuri Johannes Gabrial Van De Vijver

Hans Johannes Maria Freriks

Antonius Kempen

An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Guiding device and associated system

Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.

Apparatus for and method of reducing contamination from source material in an EUV light source

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.

Droplet generator, EUV radiation source, lithographic apparatus, method for generating droplets and device manufacturing method

A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating the fuel stream generator.

Fuel stream generator, source collector apparatus and lithographic apparatus

A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.

Module and method for producing extreme ultraviolet radiation

Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.

A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.

Radiation source

An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

Source collector, lithographic apparatus and device manufacturing method

A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.

Collector mirror assembly and method for producing extreme ultraviolet radiation

A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

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Utrecht, Netherlands

Dzmitry Labetski