Lucent Technologies Inc.

Dutt V Bulusu

Michael Geva

Robert L Mcanally

Gustav E Derkits

Robert A Resta

An apparatus and method for diffusion annealing impurities onto a plurality of wafers is described. A hollow wafer holder includes a plurality of first and second slots. The first slots are sized and shaped to receive a pair of wafers. The first slots are angled relative to a longitudinal axis of the wafer holder. The wafer holder is positioned at a first location within an ampoule, with a diffusion source being positioned at a second location within the ampoule. The ampoule is sealed and placed within or near a heat source. The heat source alters the physical state of the diffusion source to allow the entrained impurities to diffuse throughout the ampoule. The inclination of the first slots allows a sufficient clearance between the wafers and the ampoule to allow impurities within a gaseous diffusion source to extend throughout the ampoule. The presence of the second slots allows a more uniform diffusion of the impurities to the wafers.

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Lehigh, PA, United States of America

Dutt V Bulusu