Merck Patent Gmbh

Az Electronic Materials (Luxembourg) S.a.r.l.

International Business Machines Corporation

Durairaj Baskaran

JiHoon Kim

Hengpeng Wu

Guanyang Lin

Jianhui Shan

Orest Polishchuk

Sachin Bobade

Md S Rahman

Daniel Sanders

Joy Cheng

Ankit Vora

Munirathna Padmanaban

Jian Yin

Melia Tjio

Margareta Paunescu

Edward W Ng

Eunjeong Jeong

Eri Hirahara

Victor Monreal

Ashley Moore

Zhong Li

Jihoon Kim

The invention relates to a random copolymer of structure (A) comprising, a carboxylic acid bearing repeat of structure (I), a 4-vinylbenzocyclobutene derived repeat unit of structure of structure (II), a styrenic repeat unit of structure (III), an alkyl acrylate or alkyl 2-methylenealkanoate derived repeat unit of structure (IV), a hydroxy functionalized alkyl acrylate or alkyl 2-methylenealkanoate derived repeat unit of structure (V), and two end groups as shown in structure (A) one of which is H and the other is a methyl moiety substituted with Rr, Rrand Rr, wherein Rr, is a C-1 to C-8 alkyl, Rris selected from a C-1 to C-8 alkyl, a C-1 to C-8 alkylene hydroxy moiety (-alkylene-OH), a C-1-C-8 alkylenecarboxylic acid moiety (-alkylene-COH), or a benzylic alcohol comprising moiety of structure (B), Rr is a cyano moiety (—CN) or a carbonylalkyl moiety (—C(═O)—Ri), wherein Ri is a C-1 to C-8 alkyl or an aryl moiety.

Development of novel neutral layer and hydrophobic pinning mat materials for use in DSA with improved substrate compatibility

One aspect of this invention is a novel functional polymer having a polydispersity from 1 to about 1.12 comprising at least one reactive moiety, selected from a moiety comprising at least one N-coordinative functional group having at least one lone pair of electrons, a moiety comprising a dialkylsilyl group, or a mixture of both groups, wherein said reactive moiety is present in said functional styrenic polymer either on a repeat unit, on an end group or on both, and said N-coordinative functional group is either a monodentate N-coordinative functional group, a polydendate N-coordinative group or a mixture of thereof, and said monodentate N-coordinative functional group is an azide moiety (—N) or a cyano moiety (—CN). Another aspect of this invention is the use of these novel polymer to selectively deposit a DSA directing layer on a metallic substrate.

Non-thiol nitrogen based hydrophobic polymer brush materials and use thereof for modification of substrate surfaces

The present invention relates to a composition comprising components a), b) and c). The component a) is a block copolymer or a blend of block copolymers. The component b) is a low Tadditive selected from the group consisting of an oligo random oligo random copolymer b-1), an oligo diblock copolymer b-2), an oligo diblock copolymer b-3) and a mixture of at least two of these. The component c) is a is a spin casting organic solvent. The invention also pertains to the use of said compositions in directed self-assembly. The invention further pertains to the novel oligo diblock copolymer b-2) which is an oligo diblock copolymer of block A-b) and block B-b), wherein block A-b) is a random copolymer of repeat units having structures (III), and (IV and block B-b) is a random copolymer of repeat units having structures (V), and (VI).

Enhanced directed self-assembly in the presence of low Toligomers for pattern formation

The disclosed subject matter relates compounds of structure (I), and polymers of structure (II) having a polydispersity ranging from 1 to about 1.1, compositions comprising said polymers and a spin casting solvent, the process of forming a pinning layer selectively on metal with said composition and the process of using said pinning layers to affect chemoepitaxy directed self-assembly of an overlying block copolymer, and the subsequent process of pattern transfer of this self-assembled layer into a substrate by etching.

Brush polymer terminated with phosphonate for DSA

The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (&#x2014;O&#x2014;), carbonyloxy, (&#x2014;(C&#x2550;O)&#x2014;O&#x2014;), carbonate (&#x2014;O&#x2014;(C&#x2550;O)&#x2014;O&#x2014;); Lis a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process. 

Compositions and processes for self-assembly of block copolymers

The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group Xthrough said linking group L to the head group X, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks. Still further aspects of this invention are processes for forming self-assembled monolayers on a substrate, from the aged composition, and also the processes of coating these aged compositions on patterned porous dielectrics to cap them also the processes of metallization of these capped pattered porous dielectrics. 

Aromatic amino siloxane functionalized materials for use in capping porous dielectrics

The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain,wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z))is a junction group, which comprises a surface active pendant moiety Y(Z)wherein:

Block copolymers with surface-active junction groups, compositions and processes thereof

The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A, A, and Aare independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; Xand Xare individually selected organic spacers; Pis an organic polymer repeat unit moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, and Pis an end group moiety derived from a monomer containing a single polymerizable olefinic carbon double bound, andrepresents a direct valence bond to the linear polymer.  The invention also relates to using this novel coating composition to form a grafted polymer film on a substrate.

Compositions and use thereof for modification of substrate surfaces

Growing community of inventors

Bridgewater, NJ, United States of America

Durairaj Baskaran