Orc Manufacturing Co., Ltd.

Duk Lee

Jun Ishikawa

Yoshinori Kobayashi

Hidetoshi Tabata

Masaaki Matsuda

Daisuke Yamashita

Yoshio Takatsu

Jun Nonaka

An exposure device can exposes a circuit pattern while information data is suitably changed. An exposure device comprises a first light source () for irradiating a first light including ultraviolet rays, a projection exposure unit () for exposing a circuit pattern drawn on a photomask on a substrate, with the first light, a substrate stage () for mounting the substrate, a housing () for arranging the substrate stage, a second light source () for irradiating a second light including ultraviolet rays, arranged at a position different from the first light source, a spatial light modulation unit () for exposing information data formed electrically using the second light on the substrate, and a spatial optical light modulation unit driving means () for moving the spatial light modulation unit arranged on the housing () in a direction parallel to a moving direction of the substrate stage.

Exposure device

The present invention presents an exposure device, which includes an object stage on which the object is to be set, at least one aperture member for splitting a light beam from an optical source into first and second light beams, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, first and second projection optical systems for irradiating the object with the first and second light beams, at least one first optical sensor for detecting intensity of the light beam from the optical source, one or more second optical sensors for detecting intensities of the first and second light beams from the first and second projection optical systems, respectively, and a decision section for diagnosing status of a route between the aperture member and the object, based on the results of the first and second sensors.

The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.

The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a first lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from first lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.

The present invention relates to an exposure device for forming predetermined patterns onto an object. The exposure device includes an optical source for emitting a ray, an aperture member including first and second opening windows and a detection window, first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively, and an optical sensor for detecting intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed close to an area between the first and second reflective optical elements.

An optical projection system irradiating a projection light on a work. This optical projection system includes a reflector provided with a first reflection surface and a second reflection surface which reflect the projection light and change a traveling direction of the projection light, an entrance lens which guides the projection light to the first reflection surface, a reflective optics which reflects the projection light reflected by the first reflection surface and guides the projection light to the second reflection surface, an exit lens which guides the projection light reflected by the second reflection to the work, and a position adjustor which supports coaxially the entrance lens and the exit lens so that the entrance lens is spaced a predetermined distance from the exit lens, and the reflector is positioned therebetween.

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Machida, Japan

Duk Lee