Applied Materials, Inc.

Applied Materials Israel Limited

Dubi Shachal

Dror Shemesh

Noam Dotan

Ariel Ben-Porath

Alexey Stepanov

Sergio Serulnik

An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.

System and method for fast focal length alterations

A system and method for directing the object, such as a semiconductor die. The system includes a first images such as a scanning electron microscope, a stage for moving the object and a second imager and miller such as a focused ion beam generator. The object is images to locate a desired location in which the object is to be milled and a landmark that is utilized for directing the miller. The system can include additional steps of milling, analyzing and movement of the object.

System and method for directing a miller

Disclosed is a system and method for enhancing edge, topography, and materials in SEM images. The enhancements are achieved by collecting secondary electrons at narrow energy bands. This allows construction of various &ldquo;primary&rdquo; images having specific features enhanced. Further enhancement is achieved by various manipulations and combinations of the &ldquo;primary&rdquo; images to obtain a final enhanced image. Yet further enhancements are achieved by assigning color to various &ldquo;primary&rdquo; images before constructing the final image.

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Rehovot, Israel

Dubi Shachal