Tsinghua University

Shanghai Xiangzhang Electronics Co., Ltd.

Duanyi Xu

Hao Wang

Ken Chen

Jing Pei

Da Lu

Kun Qian

Guosheng Qi

Jianshe Ma

Jianping Xiong

Dalin Wu

Jianmin Liu

Xiaohui Lu

Longfa Pan

Chenyu Su

Peijun Jiang

Yi Ni

Xiaodong Fan

The present invention provides a multilevel read-only optical disk and the method for producing the same. The multilevel read-only optical disk comprises a plurality of the recording pits, each of the longitudinal sections of the recording pits has a multilevel arbitrary shape; the areas of the longitudinal sections of the recording pits are not identical each other; the area of each of the longitudinal sections of the recording pits is defined by the following formula: S=&#x222b;h(x)dx, where S represents the area of each of the longitudinal sections of the recording pits, x represents the coordinate value along the width direction of the recording pits, h(x) represents the pit-depth distribution function of the longitudinal sections of the recording pits and the region of the integration covers the whole longitudinal sections of the recording pits. Furthermore, the run length of the multilevel read-only optical disk is limited. The present invention obtains the advantage of both multilevel storage technology and run length limited (RLL) codes. They can improve prominently the storage capacity and data transfer rate of read-only optical disk without changing the wavelength of the laser and optical numerical aperture, and are most compatible with the conventional read-only optical disk system.

Multilevel read-only optical disk and method for producing the same

The invention relates to a device for photolithography of integrated circuits, at least comprising base plate, precision working table, optical head array; the optical head array adopts a line-array photosource scan-imaging device to realize the optical probe technique, and the line-array photosource scan-imaging device comprises a line-array photosource consisting of a plurality of adjacent linearly-arranged micro-photosources and the micro-imaging system performing micro-imaging for the photosource; the line-array photosource can realized not only with a plurality of micro-lasers but also with a line-array photosource device; a novel method is disclosed that can perform encoding based upon the line-array photosource scan width; an integrated circuit photolithographic method which can align the silicon wafer not only at the beginning of photolithography but also can repeatedly align it if needed during the photolithographic process.

Photolithography system having multiple adjustable light sources

Growing community of inventors

Beijing, China

Duanyi Xu