Samsung Electronics Co., Ltd.

Du-hyun Lee

Byung-kyu Lee

Woong Ko

Jae-kwan Kim

Ki-yeon Yang

Jin-Seung Sohn

Myoung-jae Lee

Sung-hoon Choa

Eun-Hyoung Cho

Hae-sung Kim

Kyoung-won Na

Myung-bok Lee

Sang-Chul Sul

Seong-yong Yoon

Jin-seung Sohn

An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.

Imprinting stamp and nano-imprinting method using the same

A stamp includes a transparent body having an inner chamber containing an inlet/outlet tube configured to have a fluid injected and removed therefrom.

Stamp, method of fabricating the stamp, and imprint method using the same

A template system, and a nano-imprint method using the same, include a template having a nano-pattern and configured to transfer the nano-pattern to a resin material on a substrate, and a pressure controlling apparatus configured to change a pressure of the template with respect to the substrate according to an intensity of bubbles captured between the substrate and the template.

Template system and nano-imprint method using the same

A stamp includes at least one protrusion on a protrusion pattern, and an end portion of the at least one protrusion may have a non-planarized surface. The end portion of the protrusion may have a concave structure, that is, the end portion includes a center region and an edge region, and the edge region is higher than the center region.

Stamp, method of manufacturing the same, and imprinting method using the stamp

Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.

Method of manufacturing nanoimprint stamp

A cross point memory array includes a structure in which holes are formed in an insulating layer and a storage node is formed in each of the holes. The storage node may include a memory resistor and a switching structure. The master for an imprint process used to form the cross-point memory array includes various pattern shapes, and the method of manufacturing the master uses various etching methods.

Cross point memory arrays, methods of manufacturing the same, masters for imprint processes, and methods of manufacturing masters

A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask.

Methods of fabricating nanoimprint stamp

Provided are a master recording medium and a method of manufacturing the master recording medium. The master recording medium includes: a plate; and a magnetic layer which is formed on the plate for magnetically transferring of a servo pattern that is to be formed on a magnetic recording medium. The method of manufacturing a master recording medium includes: engraving a polymer layer by nano imprinting to form an engraved pattern corresponding to a servo pattern to be formed on a magnetic recording medium; forming a magnetic layer which fills in the engraved pattern of the polymer layer; forming a back plate layer on the magnetic layer; and performing processing to expose the servo pattern on a surface of the magnetic layer that is opposite a surface of the magnetic layer on which the back plate layer is formed.

Master recording medium for magnetically transferring servo pattern to the magnetic recording medium and method of manufacturing the same

Provided are a magnetic recording medium and a method of manufacturing the magnetic recording medium. The magnetic recording medium includes a substrate, a soft magnetic underlayer formed on the substrate, a texturing layer formed on the soft magnetic underlayer and including a uniform pattern, and a recording layer including magnetic grains and a non-magnetic boundary region isolating the magnetic grains. The magnetic grains and the non-magnetic boundary region of the recording layer are formed into a regular granular structure by segregation according to the regular pattern of the texturing layer. Therefore, a regular granular structure can be formed in the recording layer without a process such as etching of the recording layer, so that the recording density of the magnetic recording medium can be largely improved.

Magnetic recording medium and method of manufacturing the same

A pattern template includes a flexible substrate, a template mold formed on the flexible substrate to include a pattern, and an alignment mark, the alignment mark has a greater refractive index than that of the template mold. The template is manufactured by providing a master template including a pattern area, coating resin for mold in the pattern area, forming a template mold by installing a flexible plate on the resin for mold and curing the resin for mold by radiating UV rays, separating the template mold and the master template, coating a metal thin film on the template mold, and forming an alignment mark at both sides of the template mold.

Soft template with alignment mark

Provided is a dual-side imprinting lithography system that includes a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin; a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit; a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit; a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays; and a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays.

Growing community of inventors

Suwon-si, South Korea

Du-hyun Lee