Asml Netherlands B.v.

Dries Vaast Paul Hemschoote

Frits Van Der Meulen

Christiaan Louis Valentin

Alain Louis Claude Leroux

Joost De Hoogh

Christiaan Alexander Hoogendam

Raymond Wilhelmus Louis Lafarre

Harmen Klaas Van Der Schoot

David Ferdinand Vles

Adrianus Hendrik Koevoets

Gosse Charles De Vries

Sander Catharina Reinier Derks

Jim Vincent Overkamp

Martinus Agnes Willem Cuijpers

Koos Van Berkel

Jacobus Cornelis Gerardus Van Der Sanden

Hendrikus Herman Marie Cox

Stan Henricus Van Der Meulen

Remco Yuri Van De Moesdijk

Alexander Marinus Arnoldus Huijberts

Ronald Cornelis Gerardus Gijzen

Patrick Willem Paul Limpens

Güneş Nakiboglu

Erik Johan Arlemark

Johannes Franciscus Martinus Van Santvoort

Paul Comé Henri De Wit

Evert Auke Rinze Westerhuis

Radu Donose

Robert Coenraad Wit

A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.

Gas mixing for fast temperature control of a cooling hood

An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.

Apparatus incorporating a gas lock

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

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Vosselaar, Belgium

Dries Vaast Paul Hemschoote