Applied Materials, Inc.

Drew Phillips

Mark Joseph Saly

Bhaskar Jyoti Bhuyan

Xiangjin Xie

Kevin Kashefi

David Michael Thompson

Aaron Dangerfield

Michael L McSwiney

David P Thompson

Paul F Ma

Yixiong Yang

Yu Lei

Naomi Yoshida

Wei V Tang

Yi Xu

Atashi Basu

Lin Dong

Wenyu Zhang

Srividya Natarajan

Kaliappan Muthukumar

Chen-Han Lin

Methods for selectively depositing on metallic surfaces are disclosed. Some embodiments of the disclosure utilize a hydrocarbon having at least two functional groups selected from alkene, alkyne, ketone, hydroxyl, aldehyde, or combinations thereof to form a self-assembled monolayer (SAM) on metallic surfaces.

Selective blocking of metal surfaces using bifunctional self-assembled monolayers

Methods for selectively depositing on metallic surfaces are disclosed. Some embodiments of the disclosure utilize a hydrocarbon having at least two functional groups, at least one functional group selected from amino groups, hydroxyl groups, ether linkages or combinations thereof to form a self-assembled monolayer (SAM) on metallic surfaces.

Described are methods of depositing a titanium aluminum nitride film on a substrate surface with a controlled amount of carbon. The methods include exposing a substrate surface to a titanium precursor, a nitrogen reactant and an aluminum precursor with purges of the unreacted titanium and aluminum precursors and unreacted nitrogen reactants between each exposure.

Aluminum content control of TiAIN films

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San Jose, CA, United States of America

Drew Phillips