Az Electronic Materials (luxembourg) S.a.r.l.

Clariant Finance (bvi) Limited

Az Electronic Materials USA Corp.

Hoechst Celanese Corporation

Clariant Finance Lmited

Douglas S McKenzie

M Dalil Rahman

Dinesh N Khanna

JoonYeon Cho

Clement Anyadiegwu

Huirong Yao

Salem K Mullen

Munirathna Padmanaban

Stanley F Wanat

David J Abdallah

Daniel P Aubin

Takanori Kudo

Ralph R Dammel

Ping-Hung Lu

Chester J Sobodacha

Elizabeth Wolfer

Allen G Timko

Francis Michael Houlihan

Guanyang Lin

Joseph E Oberlander

Jianhui Shan

Ruzhi Zhang

Alberto D Dioses

Sunit S Dixit

Michelle M Cook

Robert R Plass

WooKyu Kim

Venkata Gopal Reddy Chada

Yi Yl

Rhuzi Zhang

Dalil M Rahman

Kathryn H Jensen

Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.

Materials containing metal oxides, processes for making same, and processes for using same

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R, R, R, and Ris i) and at least at least one of R, R, R, and Ris ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate. 

Stable metal compounds as hardmasks and filling materials, their compositions and methods of use

The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R)(R) methylene moiety where Rand Rare independently H, C-Calkyl, C-Ccycloalkyl or C-Caryl; Ar, Ar, Arand Arare independently phenylenic and naphthalenic moiety, Rand Rare independently hydrogen or C-Calkyl; and Rand Rare independently hydrogen or C-Calkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating compositions and processes thereof

The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions.

Spin-on compositions of soluble metal oxide carboxylates and methods of their use

The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where Ris C-Calkyl, Ris C-Calkyl, Rand Rare independently hydrogen or C-Calkyl, and Ar' and Ar&#x2033; are independently phenylenic, or naphthalenic derived moieties, Rand Rare independently &#x2014;OH or &#x2014;(CH)OH where n=2-4, and Rand Rare independently hydrogen or C-Calkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):-A-B-C-&#x2003;&#x2003;(1)where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R', R&#x2033;and R&#x2032;&#x2033;are independently hydrogen or a C-Calkyl. The invention further relates to a process for forming an image using the composition.

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):A-B&#x2003;&#x2003;(1)where A is a fused aromatic ring and B has a structure (2), where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.

Antireflective coating composition comprising fused aromatic rings

The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, Rto Rare independently selected from hydrogen and C-Calkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.

Antireflective coating composition

The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where Rto Ris independently selected from H and C-Calkyl, R' and R&#x2033; is independently selected from H and C-Calkyl, X is C-Calkylene, Y is C-Calkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

Photoresist compositions comprising acetals and ketals as solvents

The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).

Process for producing film forming resins for photoresist compositions

A photoresist composition comprising a film forming resin obtained by condensing a phenol derivative and a substituted diphenyl ether, a photoactive compound, and a solvent. The photoresist composition may also contain an alkali-soluble, film-forming resin, such as a novolak resin. The photoresist of the instant invention improves the photospeed, resolution and thermal stability of the photoresist images.

Photoresist composition containing a novel polymer

The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.

Growing community of inventors

Easton, PA, United States of America

Douglas S McKenzie