Deka Products Limited Partnership

Applestone Meat Company LLC

Brooks Automation Gmbh

Semequip, Inc.

Douglas R Adams

Jason Michael Sachs

Andrew A Schnellinger

Donald J Lucas

Shannon Prescott

Christopher L Barber

James R Lowell

Bryan A Finseth

Jeffrey W Kite

Andras K Fekete

Nicholas E Holsman

Frank Sinclair

Robert T Caveney

Peter Van Der Meulen

David R Beaulieu

Brian M Lucas

Mitchell A Drew

Twan T Ha

Brent M Copertino

A DC power plant generating DC power from a variety of engines including a Stirling cycle engine. The DC power plant includes a relatively small start-up power source that is discontinued after the engine is running. A method for producing DC power for a load including starting up an engine using power supplied by a relatively small power supply supplemented by a capacitor bank, providing output from the engine to a generator, producing alternating current (AC) power by the generator, converting the AC power to direct current (DC) power, disabling output of the DC power during a first set of pre-selected conditions, limiting a rate of change of current of the DC power during a second set of pre-selected conditions, reducing conducted and radiated emissions of the DC power, disconnecting the DC power from the load under a third set of pre-selected conditions, and providing the DC power to the load.

Direct current power plant

Inner shell of an item carrier

Item carrier

Outer shell of an item carrier

Vending machine facade

Carousel

Providing vapor to a vapor-receiving device housed in a high vacuum chamber. An ion beam implanter, as an example, has a removable high voltage ion source within a high vacuum chamber and a vapor delivery system that delivers vapor to the ion source and does not interfere with removal of the ion source for maintenance. For delivering vapor to a vapor-receiving device, such as the high voltage ion source under vacuum, a flow interface device is in the form of a thermally conductive valve block. A delivery extension of the interface device automatically connects and disconnects within the high vacuum chamber with the removable vapor receiving device by respective installation and removal motions. In an ion implanter, the flow interface device or valve block and source of reactive cleaning gas are mounted in a non-interfering way on the electrically insulating bushing that insulates the ion source from the vacuum housing and the ion source may be removed without disturbing the flow interface device. Multiple vaporizers for solid material, provisions for reactive gas cleaning, and provisions for controlling flow are provided in the flow interface device.

Vapor delivery to devices under vacuum

Vapor delivery systems and methods that control the heating and flow of vapors from solid feed material, especially material that comprises cluster molecules for semiconductor manufacture. The systems and methods safely and effectively conduct the vapor to a point of utilization, especially to an ion source for ion implantation. Ion beam implantation is shown employing ions from the cluster materials. The vapor delivery system includes reactive gas cleaning of the ion source, control systems and protocols, wide dynamic range flow-control systems and vaporizer selections that are efficient and safe. Borane, decarborane, carboranes, carbon clusters and other large molecules are vaporized for ion implantation. Such systems are shown cooperating with novel vaporizers, ion sources, and reactive cleaning systems.

Vapor delivery system useful with ion sources and vaporizer for use in such system

A substrate processing apparatus comprising a frame, at least one processing module, and a substrate transport apparatus. The frame defines a first chamber with outer substrate transport openings for transporting substrates between the first chamber and an exterior of the frame. The processing module is connected to the exterior of the frame. The processing module communicates with the first chamber of the frame through at least one of the outer openings. The substrate transport apparatus is connected to the frame for transporting substrates between the first chamber and the processing module exterior to the frame. The frame has a second integral chamber formed therein. The second integral chamber communicates with the first chamber through an internal substrate transport opening of the frame. The second integral chamber of the frame has a selectable configuration from a number of predetermined configurations. The configuration of the second integral chamber to the frame is selected in accordance with a predetermined characteristic of the substrate processing apparatus.

Substrate processing apparatus with independently configurable integral load locks

A substrate processing apparatus having a substrate transport with substrate holders. The holders are adapted to vacuum hold substrates and thereby allow for rapid movement of the substrates without risk that the substrates will move off of the holders. If vacuum holding of a substrate on a holder fails, the movement of the substrate holder is automatically changed to provide a less rapid gravity only holding of the substrate on the holder.

Substrate holder having vacuum holding and gravity holding

Growing community of inventors

Pepperell, MA, United States of America

Douglas R Adams