Dow Global Technolgoies LLC

Rohm and Haas Company

Dow Silicones Corporation

Douglas J Hasso

Liang Chen

Carlos Alfonso Cruz

Yannick Saint-Gerard

Ralph Craig Even

Robert Scott Moglia

Matthew Carter

Andy Jun Li

John F Kohn

David L Malotky

Gary E Spilman

Timothy J Young

Robert Sandoval

Yinzhong Guo

James M Lipovsky

Jessica Ye Huang

Ludwik S Cygan

Miroslav Janco

Matthew J Crimmins

Joseph Jacobs

Carlos A Escobar Marin

Robert W Sandoval

Methods and apparatus for etching a high aspect ratio feature in a stack on a substrate are provided. The feature may be formed in the process of forming a 3D NAND device. Typically, the stack includes alternating layers of material such as silicon oxide and silicon nitride or silicon oxide and polysilicon. WFis provided in the etch chemistry, which substantially reduces or eliminates problematic sidewall notching. Advantageously, this improvement in sidewall notching does not introduce other tradeoffs such as increased bowing, decreased selectivity, increased capping, or decreased etch rate.

Waterborne dispersion composition

Provided is a method of modifying polycarbonate comprising blending the polycarbonate with composite particles, wherein the composite particles comprise

Method for modifying polycarbonate

Provided is a dispersion of composite particles in an aqueous medium, wherein the composite particles comprise

Polyolefin-acrylic particles

Provided is a method of modifying a blend of polycarbonate and acrylonitrile/butadiene/styrene copolymer comprising adding composite particles to the blend, wherein the composite particles comprise

Method for modifying polycarbonate blends

A method for optimizing a Hegman rating of a diluted emulsion including adjusting the shear work in the dilution mixer, wherein the adjusting the shear work may comprise raising or lowering the shear work; adjusting the temperature of the concentrated and/or diluted emulsion; if not earlier added, adding a basic aqueous solution and/or dispersing agent; adding one or more other additives; and/or adjusting the amount of any additive, basic solution or surfactant solution is provided. Also provided are diluted emulsions produced thereby and coatings made from the diluted emulsions.

Method for optimizing a hegman rating of a diluted emulsion, a diluted emulsion produced thereby, and a coating made

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Auburn, MI, United States of America

Douglas J Hasso