Advanced Technology Materials, Inc.

Other

Superior Equine Pharmaceuticals, Inc.

Douglas J Gordon

Brian A Vaartstra

Peter S Kirlin

Timothy E Glassman

Thomas H Baum

Robin A Gardiner

Sofia Pombrik

Duncan W Brown

Rein U Kirss

An improved phenylbutazone carrier composition provides increased palatability to horses. Additionally, the composition improves the bioavailability of the phenylbutazone and thus increases the horse's blood plasma levels of the medicine for the same effective dosage of the medicine.

Phenylbutazone carrier formulation showing increased bioactivity in animals

A method of forming on a substrate a metal film, comprising depositing said metal film on said substrate via chemical vapor deposition from a metalorganic complex of the formula:

Method of forming metal films on a substrate by chemical vapor deposition

A powdered carrier formulation for delivery of phenylbutazone to animals contains phenylbutazone in combination with a flavoring agent and an anticaking agent.

Phenylbutazone carrier formulation

A metal source reagent liquid solution, comprising: (i) at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex, wherein the ligand is selected from the group consisting of: .beta.-diketonates, .beta.-ketoiminates, .beta.-diiminates, C.sub.1 -C.sub.8 alkyl, C.sub.2 -C.sub.10 alkenyl, C.sub.2 -C.sub.15 cycloalkenyl, C.sub.6 -C.sub.10 aryl, C.sub.1 -C.sub.8 alkoxy, and fluorinated derivatives thereof; and (ii) a solvent for the metal coordination complex. The solutions are usefully employed for chemical vapor deposition of metals from the metal coordination complexes, such as Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Fe, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Cu, Dy, Ho, Al, Tl, Er, Sn, Pb, Tm, Bi, and/or Yb. The solvent may comprise glyme solvents, alkanols, organic ethers, aliphatic hydrocarbons, and/or aromatic hydrocarbons. Solutions of the invention having two or more metal coordination complexes are resistant to detrimental ligand exchange reactions which adversely affect the stability and/or volatilizability of the metal complex for CVD applications.

Precursor compositions for chemical vapor deposition, and ligand

Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formula

Tantalum and niobium reagents useful in chemical vapor deposition

Chemical vapor deposition of tantalum- or niobium-containing coatings

Novel tellurium compounds of the present invention have the formula:

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Pleasant Grove, UT, United States of America

Douglas J Gordon