Praxair Technology, Inc.

Sherwood Valve, LLC

Douglas Charles Heiderman

Ashwini K Sinha

Serge Marius Campeau

Stanley M Smith

Lloyd Anthony Brown

Aaron Reinicker

Neil Andrew Stephenson

Mark Leonard Malczewski

Cynthia A Hoover

Garrett R Swindlehurst

Brian Michael Meredith

Rachael A Masin

William R Gerristead

Scott Lawrence Cooper

William S Kane

Paul Crvelin

Andrew Vassallo

John Piscitelli

Michael McBearty

Robert Shih

Dragon Lu

Wen-Pin Chiu

Chien-Kang Kao

Dragonno Lu

This invention relates to a method and system for improved gas delivery for regulating gas at a substantially constant delivery pressure on a consistent basis. The system includes an automated redundant pressure regulation safety feature that is specifically configured along a flow network to significantly reduce the occurrence of pressure surges due to failure of the gas to be regulated to the delivery pressure. By reducing the occurrence of pressure surges and utilizing higher pressure package gas sources, the frequency of changeouts can be lowered.

Method and system for optimized gas delivery with automated redundant pressure regulation safety feature

A carbon adsorbent storage and dispensing system is provided with a structurally modified particulate carbon adsorbent designed with optimal volumetric surface area for a certain range of particle sizes. Bulk density and specific surface area are carefully balanced to ensure the volumetric surface area remains within an optimal range to create high performance, as measured by dispensing capacity of the dopant fluid that is reversibly adsorbed onto the structurally modified particulate carbon adsorbent.

Dopant fluid storage and dispensing systems utilizing high performance, structurally modified particulate carbon adsorbents

A novel method, composition and storage and delivery container for using antimony-containing dopant materials are provided. The composition is selected with sufficient vapor pressure to flow at a steady, sufficient and sustained flow rate into an arc chamber as part of an ion implant process. The antimony-containing material is represented by a non-carbon containing chemical formula, thereby reducing or eliminating the introduction of carbon-based deposits into the ion chamber. The composition is stored in a storage and delivery vessel under stable conditions, which includes a moisture-free environment that does not contain trace amounts of moisture. The storage and delivery container is specifically designed to allow delivery of high purity, vapor phase antimony-containing dopant material at a steady, sufficient and sustained flow rate.

Storage and delivery of antimony-containing materials to an ion implanter

A novel method, composition and system for using antimony-containing dopant materials are provided. The composition is selected with sufficient vapor pressure to flow into an arc chamber as part of an ion implant process. The antimony-containing material is represented by a non-carbon containing chemical formula, thereby reducing or eliminating the introduction of carbon-based deposits into the ion chamber. The composition is stored in a storage and delivery vessel under stable conditions, which includes a moisture-free environment that does not contain trace amounts of moisture.

Antimony-containing materials for ion implantation

A novel and improved inventive valve with a regulating function is provided that is capable of filling to higher fill pressures than previously attainable with conventional C-10 'on-off' valves. The valve contains a single flow passageway by which gas dispenses and enters the valve. A fill adapter is specially configured to engage the valve to allow filling at the higher pressures along the single flow passageway. The structure of the valve allows greater utilization of cylinder capacity; simplifies filling and dispensing with the single flow passageway; and allows for regulating gas pressure during delivery without increasing the overall size of the cylinder package.

Gas delivery valve and methods of use thereof

A novel composition, system and method for improving beam current during boron ion implantation are provided. In a preferred aspect, the boron ion implant process involves utilizing B2H6, 11BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials.

Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation

A modified vacuum actuated valve assembly and sealing mechanism is provided for improved sub-atmospheric flow stability characterized by the absence of delivery pressure spikes and flow excursions. The valve assembly includes a non-stationary thermoplastic seat and a stabber. The stabber is characterized by a top portion having a circular periphery designed to mechanically engage and disengage with an inner sealing surface of the thermoplastic seat. The sealing surface is coined to eliminate surface irregularities contained therein, thereby producing a relatively smooth coined mating inner sealing surface for the circular top portion of the stabber. The valve assembly also includes a modified bellows capable of fine tuning the delivery pressure of the valve assembly.

Modified vacuum actuated valve assembly and sealing mechanism for improved flow stability for fluids sub-atmospherically dispensed from storage and delivery systems

A novel composition, system and method thereof for improving beam current during boron ion implantation are provided. The boron ion implant process involves utilizing B2H6, BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials.

A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus.

Storage and sub-atmospheric delivery of dopant compositions for carbon ion implantation

A novel method for ion implanting isotopically enriched selenium containing source material is provided. The source material is selected and enriched in a specific mass isotope of selenium, whereby the enrichment is above natural abundance levels. The inventive method allows reduced gas consumption and reduced waste. The source material is preferably stored and delivered from a sub-atmospheric storage and delivery device to enhance safety and reliability during the selenium ion implantation process.

Supply source and method for enriched selenium ion implantation

A high pressure storage and delivery system having a fail-safe vacuum actuated valve is provided. In particular, through the innovative design of the vacuum actuated check valve, the system can accommodate up to three times the volume of product in similar size cylinders.

Fail-safe vacuum actuated valve for high pressure delivery systems

Provided is a novel system and apparatus for producing primary standard gas mixtures. The system includes providing a gas permeation device having a constant diffusion rate into a temperature controlled enclosure; connecting a supply source of a component to the permeation device; routing the component from the gas permeation device to a product container until a desired amount of said component in the product container is reached; and supplying a balance of purified gas to the product container to obtain a known concentration of component in the primary standard gas mixture.

System and apparatus for producing primary standard gas mixtures

This invention is directed to an apparatus for controlling the discharge of pressurized fluids from the outlet of a pressurized vessel, and particularly directed to multiple fluid regulating devices within the vessel for storing and controlling the flow of fluid or gases out of the vessel.

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Akron, NY, United States of America

Douglas Charles Heiderman