3m Innovative Properties Company

Douglas C Fall

Zai-Ming Qiu

John C Hulteen

A photocurable composition comprising a photoresist component, and a perfluoropolyether silane is disclosed. The composition enables easier release of phototool from a photoresist.

Photocurable compositions

A photocurable composition comprising a photoresist component, and an ethylenically unsaturated perfluoropolyether is disclosed. The composition enables easier release of phototool from a photoresist.

A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer.

Photocurable composition

Photoresist composition

A hardcoat composition comprises (a) one or more epoxy silane compounds, (b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and (c) photoacid generator.

Hardcoat composition

A phototool comprises an optically transparent substrate having designed pattern and a protective layer on the substrate. The protective layer comprises a cured hardcoat composition. The hardcoat composition comprises (i) one or more epoxy silane compounds (ii) one or more fluorochemical additives selected from the group consisting of perfluoropolyether-urethane silanes and silane-functionalized perfluoropolyether acrylate oligomers, and (iii) photo-acid generator.

Growing community of inventors

Saint Paul, MN, United States of America

Douglas C Fall