Applied Materials Israel Limited

Applied Materials, Inc.

Doron Meshulach

Gilad Almogy

Alon Litman

Ehud Tirosh

Meir Aloni

Haim Feldman

Jimmy Vishnipolsky

Mula Friedman

Ido Dolev

Yonatan Lehman

Kobi Kan

Ron Naftali

Steven Robert Rogers

Yehuda Cohen

Gadi Greenberg

Yoav Berlatzky

Shimon Levi

Efrat Rosenman

Nissim Elmaliach

Ido Kofler

Ori Sarfaty

Erez Ravid

Emanuel Elyasef

Kobi Barkan

Jeong Ho Yeo

Eyal Angel

Yonatah Lehman

A method for characterizing a surface, consisting of dividing the surface into pixels which are characterized by a parameter variation and defining blocks of the surface as respective groups of the pixels. The pixels are irradiated in multiple scans over the surface with radiation having different first polarization states. At least part of the radiation returning from the pixels is analyzed using second polarization states, to generate processed returning radiation. For each scan, block signatures of the blocks are constructed using the processed returning radiation from the group of pixels in each block. Also for each scan, a block signature variation is determined using the respective block signatures of the blocks, and, in response to the block signature variation, one of the first polarization states and at least one of the second polarization states are selected for use in subsequent examination of a test object.

Mapping variations of a surface

An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination path, and a light collection unit defining a collection path, each path having a certain angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and the light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane. Arrangements of features of the first and second patterns are selected in accordance with a diffraction response from said patterned sample along a collection channel defined by the angular orientation of the illumination and collection paths.

Optical system and method for inspection of patterned samples

Apparatus for imaging a surface, including an acousto-optic (AO) system. The AO system includes an AO element having a radiation input surface and a radiation output surface. The element is configured to receive radio-frequency (RF) pulses and a radiation input at the radiation input surface and to generate traveling beams from the radiation output surface. The AO system also includes an inhomogeneous polarization generator, positioned relative to the AO element so that the AO system outputs traveling inhomogeneously polarized beams. The apparatus includes objective optics which are configured to focus the inhomogeneously polarized beams onto the surface so as to form respective traveling spots thereon; collection optics, which are configured to collect scattered radiation from the traveling spots and to focus the scattered radiation to form respective image spots; and a detector which is arranged to receive the respective image spots and to generate a signal in response thereto.

Scanning microscopy using inhomogeneous polarization

A method for characterizing a surface of a sample object, the method including dividing the surface into pixels which are characterized by a parameter variation, and defining blocks of the surface as respective groups of the pixels. The method further includes irradiating the pixels in multiple scans over the surface with radiation having different, respective types of polarization, and detecting returning radiation from the pixels in response to each of the scans. For each scan, respective block signatures of the blocks are constructed, in response to the returning radiation from the group of pixels in each block. Also for each scan, a block signature variation using the respective block signatures of the blocks is determined. In response to the block signature variation, one or more of the types of polarization for use in subsequent examination of a test object are selected.

High throughput across-wafer-variation mapping

The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method including: (i) determining multiple intermediate schemes such as to allow printing corresponding intermediate images on an object; wherein at least one intermediate scheme comprises directing at least one interference pattern toward at least one location corresponding to at least one group of highly dense shapes; (ii) generating an array of light entities in response to an intermediate scheme; (iii) directing the array of light entities towards the object to form the intermediate image; and (iv) moving the object relative to the light entities while repeating the steps of generating and directing to expose the object with the image. The invention provides a system that includes: (i) means for determining multiple intermediate schemes such as to allow printing corresponding intermediate images on an object; wherein at least one intermediate scheme comprises directing at least one interference pattern towards at least one location corresponding to at least one group of highly dense shapes; (ii) a programmable optical radiation source for generating an array of light entities in response to an intermediate scheme; (iii) optics for directing the array of light entities towards the object to form the intermediate image; and (iv) a translator for moving the object relative to the light entities while repeating the steps of generating and directing to expose the object with the image.

High resolution printer and a method for high resolution printing

A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.

Raster frame beam system for electron beam lithography

Apparatus for imaging a surface, including scanning optics, which are configured to scan and focus one or more traveling beams onto the surface so as to form one or more traveling spots thereon. The apparatus also includes collection optics, which are arranged to collect radiation scattered from the one or more traveling spots and to focus the radiation to form one or more image spots traveling along a line. The apparatus also has a detecting assembly, which consists of a detector which is configured to generate a signal in response to the one or more traveling image spots, and a detector entry port interposed between the collection optics and the detector, which is coincident with the line. The apparatus also includes phase and/or polarization altering elements for the traveling beams.

Scanning microscopy

A method for imaging a surface includes generating a traveling lens in an acousto-optic material and incorporating a traveling mask into a portion of the traveling lens so as to produce a composite traveling lens. The method further includes irradiating the composite traveling lens so as to produce a composite focused beam having a spatial variation across the composite focused beam. The composite focused beam is directed onto a region of the surface so as to generate radiation characteristic of the region from the region. The radiation is imaged onto a detector so as to generate a signal characteristic of the region, responsively to the spatial variation.

One-dimensional phase contrast microscopy with a traveling lens generated by a step function change

A method for scanning a surface, consisting of focusing an array of optical beams using optics having an axis, so as to illuminate a region of the surface intercepted by the axis, such that each optical beam illuminates a portion of a respective sub-region within the region. The method further includes moving at least one of the array and the surface so as to cause a translation of the surface relative to the axis in a first direction. During the translation in the first direction, each of the optical beams is scanned over the respective sub-region in a second direction, which is different from the first direction.

Optical spot grid array scanning system

A system and method for printing a pattern, using third harmonic generation. The method includes: (i) determining an illumination scheme in response to the pattern; and (ii) directing, in response to the determination, at least one beam of radiation having a fundamental frequency, via a medium, towards an intermediate layer such as to excite at least one third harmonic beam that propagates through at least a portion of the intermediate layer towards a radiation sensitive layer; whereas the radiation sensitive layer is sensitive to third harmonic radiation and is substantially not sensitive to radiation of the fundamental frequency.

Growing community of inventors

Ramat Gan, Israel

Doron Meshulach