Carboncompetence Gmbh

Doris Steinmuller-Nethl

Detlef Steinmuller

The invention relates to a device () and method for applying a carbon layer, in particular a diamond layer, to a substrate () by means of chemical vapour deposition, comprising a deposition chamber () into which a process gas, in particular molecular hydrogen and/or a mixture of molecular hydrogen and a carbon-containing gas, such as methane can be supplied, wherein a gas inlet and gas activation element () is provided in the form of a hollow body with a flow channel () for the process gas, a wall () surrounding the flow channel (), and an outlet opening () feeding from the flow channel () into the deposition chamber (), and a heating device () is provided for heating the wall () of the gas inlet and gas activation element ().

Method for applying a carbon layer to a substrate comprising introducing a process gas into a deposition chamber via a gas inlet and gas activation element

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Aldrans, Austria

Doris Steinmuller-Nethl