Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Motorola Corporation

Dongjin Semichem Co., Ltd.

Az Electronic Materials (japan) K.k.

Doo-Hee Jung

Jeong-Min Park

Hi-Kuk Lee

Joo-Ae Youn

Hong-Sick Park

Jong-Hyun Choung

Bong-Kyun Kim

Byeong-Jin Lee

Sun-Young Hong

Woo-Seok Jeon

Won-Suk Shin

Kyung-Su Mun

Sang-Gab Kim

Min-Seok Oh

Jin-Ho Ju

Kio Lee

Seung-Ha Choi

Joo-han Kim

Sung-Gul Hwang

Ki-Hyuk Koo

Jae-young Choi

Hoon Jong Kang

Paul M Pierce

Dong-Min Kim

Shi-Yul Kim

Yang-Ho Jung

Cheol-Gon Lee

Yong-Su Lee

Jae-Sung Kim

Jung-In Park

Hyoc-Min Youn

Sang-Woo Whangbo

Joo-Han Kim

Joo-Ae Yoon

Deok-Man Kang

Hyoc-Min Yoon

Si-Young Jung

Ki-Sik Choi

An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a &#x2014;COO&#x2014; group.

Organic layer composition and liquid crystal display using the same

A liquid crystal display (LCD) is provided that includes: a first substrate; a gate line formed on the first substrate; a data line intersecting the gate line to define a pixel; a thin-film transistor (TFT) connected to the gate line and the data line and formed in the pixel; a sustain electrode line including a first sustain electrode that passes through the pixel, so as to divide the pixel into a first region and a transparent second region, and a second sustain electrodes that extend perpendicularly from the first sustain electrode; and a first pixel electrode connected to the TFT, disposed in the first region.

Liquid crystal display

A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 &#x3bc;m to less than 4 &#x3bc;m. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

Manufacturing thin film transistor array panels for flat panel displays

A display substrate includes an insulating substrate, a thin film transistor, a contact electrode, and a pixel electrode. The thin film transistor includes a control electrode, a semiconductor pattern, a first electrode, and a second electrode. The control electrode is on the insulating substrate. The semiconductor pattern is on the control electrode. The first electrode is on the semiconductor pattern. The second electrode is spaced apart from the first electrode on the semiconductor pattern. The contact electrode includes a contact portion and an undercut portion. The contact portion is electrically connected to the second electrode to partially expose the semiconductor pattern. The undercut portion is electrically connected to the contact portion to cover the semiconductor pattern. The pixel electrode is electrically connected to the second electrode through the contact portion of the contact electrode.

Display substrate, display device having the same and method of manufacturing the same

A display panel includes a substrate, signal lines, a thin film transistor, a pixel electrode and a dummy opening. The substrate has a display area and a peripheral area surrounding the display area. The signal lines are disposed on the substrate and intersect each other to define a unit pixel. The thin film transistor is electrically connected to the signal lines and disposed at the unit pixel. The pixel electrode is electrically connected to the thin film transistor. The pixel electrode is formed in the unit pixel. The dummy opening is disposed at the peripheral area and spaced apart from the signal lines.

Display panel, mask and method of manufacturing the same

A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.

Photoresist composition and method of forming a photoresist pattern using the same

A display substrate includes a first metal pattern, a first insulating layer, a first electrode, and a second metal pattern. The first metal pattern includes a gate line and a signal line. The first insulating layer is disposed on a substrate having the first metal pattern formed thereon. A first opening passes through the first insulating layer to partially expose the signal line. The first electrode is disposed on the first insulating layer corresponding to a unit pixel. The second metal pattern includes a connection electrode contacting the first electrode and the signal line through the first opening and a data line.

Display substrate and method of manufacturing the same

A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. The acryl resin makes up about 1% to about 15% of the total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.

Photoresist composition and method of manufacturing a thin-film transistor substrate using the same

A method of manufacturing a thin film transistor array panel, including: forming gate lines on a substrate; forming a gate insulating layer on the gate lines; forming semiconductor layers on the gate insulating layer; forming data lines and drain electrodes on the semiconductor layers; depositing a passivation layer on the data lines and the drain electrodes; forming a first photoresist layer including a first portion and a second portion that is thinner than the first portion on the passivation layer; forming a first preliminary contact hole exposing the data lines by etching the passivation layer by using the first photoresist layer as a mask; removing the second portion of the first photoresist; forming a first contact hole by expanding the first preliminary contact hole and opening portions by etching the passivation layer by using the first portion of the first photoresist layer as a mask; depositing a conductor layer; and forming pixel electrodes in the opening portions and a first contact assistant member in the first contact hole by removing the first photoresist layer and the conductor layer located thereon.

Thin film transistor array panel and method of manufacture

Communication device

In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern.  wherein Rand Rindependently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.

Housing for a communication device

Method of manufacturing display substrate having improved contact with pixel electrode

Growing community of inventors

Seoul, South Korea

Doo-Hee Jung