Samsung Electronics Co., Ltd.

Doo Cheol Park

Kwang-Min Lee

Ju Hwan Jung

Hyoung Soo Ko

Won Joo Kim

Seok Lee

Myung-Sun Kim

Seung Hyuk Chang

Hee Woo Park

An image sensor includes a unit pixel including a plurality of color pixels with a depth pixel. A first signal line group of first signal lines is used to supply first control signals that control operation of the plurality of color pixels, and a separate second signal line group of second signal lines is used to supply second control signals that control operation of the depth pixel.

Sensor, data processing system, and operating method

A method of fabricating a microlens includes forming layer of photoresist on a substrate, patterning the layer of photoresist, and then reflowing the photoresist pattern. The layer of photoresist is formed by coating the substrate with liquid photoresist whose viscosity is 150 to 250 cp. A depth sensor includes a substrate and photoelectric conversion elements at an upper portion of the substrate, a metal wiring section disposed on the substrate, an array of the microlenses for focusing incident light as beams onto the photoelectric conversion elements and which beams avoid the wirings of the metal wiring section. The depths sensor also includes a layer presenting a flat upper surface on which the microlenses are formed. The layer may be a dedicated planarization layer or an IR filter, interposed between the microlenses and the metal wiring section.

Method of fabricating microlens, and depth sensor including microlens

Growing community of inventors

Hwaseong-si, South Korea

Doo Cheol Park