E.i. Dupont De Nemours and Company

Donnie Joe Sam

Mark A Wuonola

Substituted dioxolanes are provided having the formula ##STR1## wherein R.sup.1 and R.sup.2 are H or a phenyl group substituted with up to 5 substituents of lower alkyl or nitro, with the proviso that at least one of R.sup.1 and R.sup.2 is a phenyl group having an orthonitro substituent; and R.sup.3 and R.sup.4 are each H or lower alkyl. These dioxolanes, as well as appropriate dioxanes, are used to intercalate a polyoxymethylene polymer to make such a polymer having thermally stable but photochemically sensitive and degradable random linkages ##STR2## in the chain where n is 0 or 1, R.sup.3 and R.sup.4 are H or lower alkyl and at least one of R.sup.1 and R.sup.2 is a phenyl group with an orthonitro substituent. By exposing a film of the polymer to light through a transparency followed by heating or a heated treatment with base, a relief image of the copy on the transparency is obtained.

Ortho-nitrophenylethylene glycols

Substituted dioxolanes are provided having the formula ##STR1## wherein R.sup.1 and R.sup.2 are H or a phenyl group substituted with up to 5 substituents of lower alkyl or nitro, with the proviso that at least one of F.sup.1 and R.sup.2 is a phenyl group having an orthonitro substituent; and R.sup.3 and R.sup.4 are each H or lower alkyl. These dioxolanes, as well as appropriate dioxanes, are used to intercalate a polyoxymethylene polymer to make such a polymer having thermally stable but photochemically sensitive and degradable random linkages ##STR2## in the chain where n is 0 or 1, R.sup.3 and R.sup.4 are H or lower alkyl and at least one of R.sup.1 and R.sup.2 is a phenyl group with an orthonitro substituent. By exposing a film of the polymer to light through a transparency followed by heating or a heated treatment with base, a relief image of the copy on the transparency is obtained.

Substituted dioxolanes and photosensitive and degradable polymers useful

Compounds of the formula ##STR1## wherein R.sub.1 is hydrogen, alkali metal, alkyl, substituted alkyl, alkylsulfenyl or acyl; R.sub.2 is alkyl or cyclopropyl; R.sub.3 is hydrogen, chlorine, bromine or fluorine; n and p are 0 or 1 and A is a mineral acid are useful as fungicides. A representative compound is 6-chloro-2-ethyl-1H-imidazo[4,5-b]quinoxaline.

Imidazoquinoxaline fungicides

Polyoxymethylene polymers having thermally stable but photochemically sensitive and degradable random linkages ##EQU1## in the chain where n is 0 or 1, R.sup.3 and R.sup.4 are H or lower alkyl and at least one of R.sup.1 and R.sup.2 is a phenyl group with an orthonitro substituent are made by intercalating a polyoxymethylene polymer with the appropriate dioxane or dioxolane. By exposing a film of the polymer to light through a transparency followed by heating or a heated treatment with base, a relief image of the copy on the transparency is obtained.

Photosensitive and degradable polyoxymethylene polymers and their

Compounds of the formula ##SPC1## Wherein R.sub.1 is alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, chloroalkyl, bromoalkyl, or cyanoalkyl; R.sub.2 is hydrogen, chlorine, bromine, or fluorine; R.sub.3 is alkyl or alkenyl; and n is 0 or 1 are useful as fungicides. A representative compound is 3-amino-6-chloro-2-propionamidoquinoxaline.

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Newark, DE, United States of America

Donnie Joe Sam