Nissin Electric Co., Ltd.

Dongwei Li

Yasunori Ando

Kiyoshi Kubota

A capacitive element using a liquid as a dielectric, whereby the capacitance is prevented from changing. The capacitive element is equipped with: a storage container that has an inlet port for introducing a liquid serving as a dielectric, has an outlet port for discharging the liquid, and is filled with the liquid; and at least one pair of electrodes that are provided in the storage container and face each other, wherein an opening section for exhausting air bubbles in the storage container is formed in an upper wall of the storage container.

Capacitive element and plasma processing device

The impedance of an antenna is reduced and gaps generated between electrodes constituting a capacitance element and a dielectric body are eliminated. An antenna () for generating inductively coupled plasma P includes at least two conductor elements (), an insulation element () that is arranged between the mutually adjacent conductor elements () and insulates the conductor elements (), and a capacitance element () that is connected electrically to and in series with the mutually adjacent conductor elements (). The capacitance element () is configured from a first electrode (A) electrically connected to one of the mutually adjacent conductor elements (), a second electrode (B) electrically connected to the other of the mutually adjacent conductor elements (), and a liquid dielectric body filling the space between the first electrode (A) and the second electrode (B).

Antenna for generating plasma, and plasma treatment device and antenna structure provided with antenna for generating plasma

Provided are an antenna, which is disposed in a vacuum chamber for generating an inductively coupled plasma, and a plasma processing device. The antenna and the plasma processing device suppress increase of the impedance even if the antenna is lengthened. An antennais disposed in a vacuum chamberfor generating an inductively coupled plasmain the vacuum chamberby applying a high frequency current. The antennaincludes an insulating pipeand a hollow antenna bodywhich is disposed in the insulating pipeand in which cooling water flows. The antenna bodyhas a structure that a plurality of metal pipesare connected in series with a hollow insulatorinterposed between the adjacent metal pipes, and each connecting portion has a sealing function with respect to vacuum and the cooling water.

Antenna for plasma generation and plasma processing device having the same

Provided is a pipe holding connection structure configured so that the width of the entire structure is reduced and so that the number of parts and the number of assembly work processes are reduced. This pipe holding connection structure is provided with: a housing affixed so as to air-tightly close the opening of a vacuum container; a first pipe having a portion near an end portion thereof extending through both the opening and the housing; and a second pipe having a female thread part engaging with a male thread part located at the end portion. The pipe has a locking part. Fluid is caused to flow through both the pipes. Pieces of packing are provided between the pipe and the housing and between the pipe and an end portion of the pipe, respectively. This pipe holding connection structure can be used for a high-frequency antenna device.

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Kyoto, Japan

Dongwei Li