Boe Technology Group Co., Ltd.

Ordos Yuansheng Optoelectronics Co., Ltd.

Beijing University of Technology

Dongwei Li

Xu Bin Liu

Zhiming Lin

Chunchieh Huang

Xiaodong Han

Chun Chieh Huang

Yan Ma

Baojun Li

De Zhang

Xiaolin Xin

Qingsong Deng

Bili Baiyin

Lihua Wang

Zhiyuan Hao

A method utilizing cold welding to prepare grain boundaries having different included angles includes using a device including a support member. Two bent members are arranged opposite to each other in the support member. One ends of the two bent members are both fixedly connected to the support member, one end, away from the support member, of any bent member is fixedly connected to a first sample, one end, away from the support member, of the other bent member is fixedly connected to a second sample, and the first sample and the second sample are arranged corresponding to each other. The bent member includes a first metal sheet and a second metal sheet having different thermal expansion coefficients. An angle between the first sample and the second sample during butt welding can be controlled by changing an included angle of a bimetallic sheet.

Method utilizing cold welding to prepare grain boundaries having different included angles

The disclosure discloses a frame component, which includes a frame with a positioning slot in an inner edge thereof, a fabrication strip with grooves, and a plurality of support pieces; where the fabrication strip is detachably arranged in the positioning slot, and the plurality of support pieces are fixed in the grooves to form a support plane for supporting a mask.

Frame component

The embodiments of the present disclosure propose a device for inspecting a mask plate, a method for inspecting a mask plate, and a corresponding method for controlling light sources. The device includes: an image sensor configured to capture an image of the mask plate; and a plurality of light sources disposed on one side of the mask plate opposite to the image sensor, wherein at least one of the plurality of light sources is configure to emit light when the image sensor is capturing an image of a first region of the mask plate, and the at least one light source comprises light sources within a first range, wherein the first range corresponds to the first region and an orthographic projection of the image sensor on a light source plane falls within the first range. The method for controlling light sources includes: turning on at least one of a plurality of light sources disposed on one side of the mask plate opposite to an image sensor, which corresponds to a first region of the mask plate to be inspected, when the image sensor is moved to a position corresponding to the first region.

Device for inspecting mask plate, method for inspecting mask plate, and corresponding method for controlling light sources

The present disclosure provides a mask assembly and a method for manufacturing the same, and a display device. The mask assembly includes a frame, a first mask and a second mask, and the first mask and the second mask are superposed on the frame; the first mask includes an opening region, the second mask includes an evaporation region in which a first evaporation hole is provided for allowing an evaporation material to pass therethrough and a buffer region surrounding the evaporation region and configured to block off the evaporation material, and an orthographic projection of the boundary of the opening region onto the second mask is located within the buffer region.

Mask assembly and method for manufacturing the same and display device

The present disclosure discloses an alignment mark structure, a mask, a substrate and an alignment method for the mask and the substrate. The alignment mark structure includes: at least two first alignment marks and at least two second alignment marks provided on the mask, a pattern size of the first alignment marks being larger than that of the second alignment marks; at least two third alignment marks and at least two fourth alignment marks provided on the substrate, wherein the number and the location of the third alignment marks correspond to the number and the location of the first alignment marks, respectively, and the number and the location of the fourth alignment marks correspond to the number and the location of the second alignment marks, respectively.

Alignment mark structure, mask, substrate and alignment method

Growing community of inventors

Beijing, China

Dongwei Li