Semes Co., Ltd.

Dongok Ahn

Pil Kyun Heo

Jaeseong Lee

Hyun Yoon

Ji Hoon Yoo

Yong-Jun Seo

Myeong Jun Lim

Kwangsup Kim

Doyeon Kim

Youngje Um

Yerim Yeon

Jungsuk Goh

Choonghyun Lee

Byeong Geun Kim

Yoonki Sa

Junho Oh

The inventive concept provides a method for treating a substrate. In an embodiment, the substrate treating method includes a treatment step of treating a residue on the substrate with a first fluid in a supercritical state and a second fluid in a supercritical state in a process space of a chamber, and the first fluid in the supercritical state and the second fluid in the supercritical state have different densities.

Method and apparatus for treating substrate

An inspection module is disclosed for inspecting a droplet from an ink jet head. The inspection module includes a sensor located under the ink jet head and measuring a distance between the droplet and the sensor in real time; a variable lens changing an operating distance based on the measured distance of the sensor; and a camera for capturing an image of the droplet. The inspection module further includes a droplet inspecting part inspecting the droplet image captured by the camera.

Droplet inspection module and droplet inspection method

Growing community of inventors

Gyeonggi-do, South Korea

Dongok Ahn