Lg Chem, Ltd

Dongmyung Shin

Dong-Ryul Kim

Sang Ki Chun

Chanyeup Chung

Bum Woo Lee

Jongmin Moon

A method of manufacturing a transparent conductive film comprising preparing a substrate; and forming a thin film comprising&#x2014;a compound of Chemical Formula 1 on the substrate:BaLaSnO&#x2003;&#x2003;Formula 1wherein p, q, m and n are atomic content ratios, p, m and n each are independently more than 0 and less than or equal to 6, and q is 0 or 1,

Method for manufacturing transparent conductive film

The present invention relates to a system and a method of removing a foreign material by using an electric field adsorbing scheme, which are capable of easily adsorbing and removing a foreign material on a surface of a film by using an electric field adsorbing scheme through a micro-current (several micro ampere) voltage driving method, not a surface treatment method, such as plasma discharge processing, corona discharge processing, and air blowing processing, which causes damage to the surface of the film, in a processing process for removing the foreign material on the surface of the film, and particularly, which exclude high pressure discharge processing and the like, thereby decreasing an incurrence rate of a safety accident of an operator and preventing a surface of a film from being scratched.

System and method for removing foreign substances by using electric field adsorption method

There are provided a transparent conductive film and a method for preparing the same. The transparent conductive film of the present application comprises a compound having a crystalline structure and represented by Chemical Formula 1 and thus can be applied as a technology substituting for conventional ITO conductive films.

Growing community of inventors

Daejeon, South Korea

Dongmyung Shin