Samsung Display Co., Ltd.

Dongmin Lee

Hyuneok Shin

Dokeun Song

Sukyoung Yang

Sangwon Shin

Joonyong Park

Sangwoo Sohn

Changoh Jeong

Hyunah Sung

Juhyun Lee

Sanggab Kim

Yunjong Yeo

Jongoh Seo

Chanwoo Yang

Kyungseop Kim

Joongeol Lee

Byungsoo So

Taewook Kang

Shin Il Choi

Byeong-Beom Kim

Hongsick Park

Kyeong Su Ko

Dongsung Lee

Honglong Ning

Sang Gab Kim

Kyeongsu Ko

Hyunju Kang

Cheolho Park

Janghyun Kim

Samtae Jeong

Donghyeok Lee

Hyunwoo Kang

Yu-Gwang Jeong

Byoungyong Kim

Jungha Son

Gyungmin Baek

Hansu Kim

Gugrae Jo

Jang-Hyun Kim

Gwangmin Cha

Jongjun Baek

Shinil Choi

Joon Woo Bae

Jonghoon Choi

Yungbin Chung

Daewon Choi

Gwan Ha Kim

Jinho Hwang

Youngrok Kim

KyeongSu Ko

Jihwan Kim

Taeho Kang

Seunghyun Jang

Byungkyu Son

Yeonhee Jeon

Jaewoo Jeong

Joonwoo Bae

A display device includes: a wiring line on a first inorganic insulating layer; a second inorganic insulating layer covering the wiring line; and a display element on the second inorganic insulating layer, wherein the wiring line includes: a lower layer including at least one of aluminum (Al) or an aluminum (Al) alloy; an upper layer on the lower layer and including a niobium titanium (NbTi) alloy; and an intermediate layer arranged between the lower layer and the upper layer and including at least one of a niobium titanium aluminum (NbTiAl) alloy or a titanium aluminum (TiAl) alloy.

Display device and method of manufacturing the display device

A display device includes a substrate, a metal pattern on the substrate, the metal pattern including a first alloy layer and a first metal layer, wherein the first alloy layer includes a titanium alloy including at least one of copper or zinc and the first metal layer is on the first alloy layer, an active layer on the metal pattern and a gate electrode on the active layer, the gate electrode including a second alloy layer and a second metal layer, wherein the second alloy layer includes a titanium alloy including at least one of copper or zinc and the second metal layer is on the second alloy layer.

Display device and method of manufacturing the same

Provided are a thin-film transistor substrate, a manufacturing method thereof, and a display apparatus. The thin-film transistor substrate includes: a substrate; a buffer layer on the substrate; a semiconductor layer arranged on the buffer layer and including a first conductive area, a second conductive area, and a channel area between the first conductive area and the second conductive area; a first dopant doped in an upper portion of the channel area at a first concentration; a second dopant doped in a lower portion of the channel area at a second concentration and being of a different type from a type of the first dopant; a gate insulating layer covering the semiconductor layer; and a gate electrode overlapping the channel area in a plan view and disposed on the gate insulating layer.

Thin-film transistor substrate, manufacturing method thereof, and display apparatus employing the thin-film transistor substrate

A display device includes: a first inorganic insulating layer; a wiring disposed on the first inorganic insulating layer; a second inorganic insulating layer covering the wiring; and a display element disposed on the second inorganic insulating layer, wherein the wiring includes a lower layer including at least one of aluminum and an aluminum alloy, an upper layer disposed on the lower layer and including at least one of titanium and titanium oxide, and an intermediate layer disposed between the lower layer and the upper layer and including titanium aluminide.

Provided is a display device including a display panel including a base layer including a display region which includes a first region and a second region disposed adjacent to the first region, a plurality of insulating layers disposed on the base layer, and a first pixel and a second pixel disposed on the base layer, wherein the first pixel includes a first light-emitting element disposed in the first region, a first pixel circuit electrically connected to the first light-emitting element, and a wiring layer disposed on at least one insulating layer and containing a conductive polymer, and the wiring layer includes a conductive portion which electrically connects the first pixel circuit and the first light-emitting element, and an insulating portion disposed adjacent to the conductive portion.

Display device, electronic device, and fabricating method of the display device

A display apparatus includes a first insulating layer, a conductive pattern disposed directly on the first insulating layer, a cladding pattern disposed on side surfaces of the conductive pattern, and a second insulating layer on the conductive pattern and the cladding pattern, wherein the cladding pattern includes a first cladding layer including a first material and a second cladding layer including a second material different from the first material.

Display apparatus and method of manufacturing the same

A display device includes a base substrate, a buffer layer disposed on the base substrate, an active layer disposed on the buffer layer, a first gate insulation layer disposed on the active layer, a first conductive layer disposed on the first gate insulation layer and which is a single-layer including an aluminum alloy, a second gate insulation layer disposed on the first conductive layer, a second conductive layer disposed on the second gate insulation layer and which is a single-layer including an aluminum alloy, an insulation interlayer disposed on the second conductive layer, and a third conductive layer disposed on the insulation interlayer, directly contacting the first conductive layer through a first gate contact hole defined in the insulation interlayer and the second gate insulation layer, and directly contacting the second conductive layer through a second gate contact hole defined in the insulation interlayer.

Method of manufacturing display device including third conductive layer connected to active layer and directly contacts first conductive layer

A display device includes an active layer in a display area, a first gate insulation layer on the active layer, a first gate line on the first gate insulation layer in the display area, a first signal line in the same layer as the first gate line in a non-display area and including the same material as that of the first gate line including molybdenum, a second gate insulation layer on the first gate line and the first signal line, a second gate line on the second gate insulation layer in the display area, and a second signal line in the same layer as the second gate line in the non-display area and including the same material as that of the second gate line including aluminum or an aluminum alloy. A width of the first signal line is greater than a width of the second signal line.

Display device and method of manufacturing display device

A display panel includes: a base layer; a signal line disposed on the base layer, the signal line including: a first layer including aluminum; and a second layer directly disposed on the first layer, the second layer including a niobium-titanium alloy; a first thin film transistor connected to the signal line; a second thin film transistor disposed on the base layer; a capacitor electrically connected to the second thin film transistor; and a light emitting element electrically connected to the second thin film transistor.

Display panel and method of fabricating the same

A display apparatus includes a substrate, a gate electrode overlapping the substrate, and a semiconductor layer positioned between the substrate and the gate electrode. The semiconductor layer includes a first layer and a second layer positioned between the first layer and the gate electrode. A hydrogen content of the first layer is greater than a hydrogen content of the second layer.

A display device includes: a thin-film transistor on a substrate, the thin-film transistor including on the substrate: an active layer; a gate electrode overlapping the active layer; a source electrode and a drain electrode electrically connected to the active layer and including a first metal material; and a first capping layer which covers each of the source electrode and the drain electrode, the first capping layer having a Young's modulus greater than that of the first metal material.

A conductive line for a display device may include a first layer including aluminum (Al) or an aluminum alloy, a second layer disposed on the first layer, the second layer including titanium nitride (TiN), and a third layer disposed on the second layer, the third layer including titanium (Ti) and having a multilayer structure including a plurality of stacked sub-layers.

Method of manufacturing conductive line for display device including the same

Display device including third conductive layer directly contacting first conductive layer and second conductive layer

A display panel includes a substrate including a component area, a display area at least partially surrounding the component area, and a first non-display area at least partially surrounding the display area. A first wiring is in the display area and extends in a first direction to face the component area. A second wiring is in the display area and extends in the first direction to face the component area. The second wiring is spaced apart from the first wiring with the component area therebetween. A pixel circuit is connected to one of the first and second wirings and includes at least one thin-film transistor. A display element is connected to the pixel circuit. A cross-sectional area of the first wiring crossing in a second direction that is perpendicular to the first direction is different from a cross-sectional area of the second wiring crossing in the second direction.

Display panel and display device including first and second wirings

Growing community of inventors

Anyang-si, South Korea

Dongmin Lee