Samsung Electronics Co., Ltd.

Dongkyun Park

Hyun Uk Park

Joon Hyuk Kim

Jin-Su Lee

Minhee Cho

Hyongsoo Kim

Mansug Kang

Junghwan Oh

Han-young Kim

Hyun-Suk Lee

Sangjun Park

Gihee Cho

Jongmyeong Lee

Heesook Park

Kukhan Yoon

Young-Seok Choi

Jiseung Lee

Hojun Kwon

A semiconductor device is disclosed. The semiconductor device includes a substrate and capacitor electrically connected to the substrate. The capacitor includes a lower electrode, a dielectric layer disposed on the lower electrode, and an upper electrode disposed on the dielectric layer. The upper electrode includes a first electrode on the dielectric layer and a second electrode on the first electrode, such that the first electrode is disposed between the dielectric layer and the second electrode. The first electrode contains metal oxynitride having a formula of MON, in which an atomic ratio (y/x) of oxygen (O) to metallic element (M) is a value in the range from 0.5 to 2.

Capacitor and a semiconductor device including the same

A semiconductor device includes a plurality of capacitors disposed on a substrate and a support pattern supporting upper portions and lower portions of the capacitors. Each of the capacitors includes a lower electrode, an upper electrode, and a dielectric layer between the lower and upper electrodes. The lower electrode includes a first electrode portion electrically connected to the substrate and having a solid shape and a second electrode portion stacked on the first electrode portion and having a shape comprising an opening therein. The support pattern includes an upper pattern contacting sidewalls of top end portions of the lower electrodes and a lower pattern vertically spaced apart from the upper pattern. The lower pattern contacts sidewalls under the top end portions of the lower electrodes.

Semiconductor devices having hybrid capacitors and methods for fabricating the same

Capacitor of a semiconductor device, and a method of fabricating the same, include sequentially forming a mold structure and a polysilicon pattern over a semiconductor substrate, patterning the mold structure using the polysilicon pattern as an etch mask to form lower electrode holes penetrating the mold structure, forming a protection layer covering a surface of the polysilicon pattern, forming lower electrodes in the lower electrode holes provided with the protection layer, removing the polysilicon pattern and the protection layer to expose upper sidewalls of the lower electrodes, removing the mold structure to expose lower sidewalls of the lower electrodes, and sequentially forming a dielectric and an upper electrode covering the lower electrodes.

Capacitor of semiconductor device and method of fabricating the same

An integrated circuit device with capacitors and methods of forming the integrated circuit device are provided. The methods may include forming a first lower capacitor electrode pattern on an inner surface of a hole in a mold layer. The first lower capacitor electrode pattern may have a hollow cylindrical shape and an opening in an upper surface. The method may further include forming a second lower capacitor electrode pattern plugging the opening and an upper surface of the second lower capacitor electrode pattern may be planar. The first and the second lower capacitor electrode patterns may comprise a lower capacitor electrode including a void. Additionally, the method may include removing the mold layer to expose the lower capacitor electrode, forming a dielectric layer on the lower capacitor electrode, and forming an upper capacitor electrode layer on the dielectric layer.

Integrated circuit devices with capacitor and methods of manufacturing the same

A capacitor of semiconductor device is provided including a lower electrode on a semiconductor substrate; a dielectric film covering a surface of the lower electrode; and an upper electrode covering the dielectric film. The lower electrode includes a first conductive pattern having a groove region defined by a bottom portion and a sidewall portion; and a first core support pattern disposed in the groove region of the first conductive pattern and exposing a portion of inner sidewall of the first conductive pattern. Related methods are also provided herein.

Highly integrated semiconductor devices including capacitors

Growing community of inventors

Suwon-si, South Korea

Dongkyun Park