Samsung Display Co., Ltd.

Frontics, Inc.

Dongil Son

Cheonjae Maeng

Jeaheon Ahn

Taewoo Lim

Dongwoo Kim

Minsu Kim

Jang-Il Kim

Jong-Hoon Kim

Wontae Kim

Jinho Park

Jeongki Kim

Keunwoo Park

Seongyeon Lee

Kang-min Kim

Hongbeom Lee

Donghee Lee

Baekhee Lee

Kyungtae Chae

TaeGyun Kim

Namheon Kim

Joohwan Park

Young-hoon Lee

Hongkee Jung

Dongil Kwon

Yunhee Lee

A display device including an optical member, a display panel disposed above the optical member, and a plurality of light emitting units disposed below the optical member and providing a first color light to the optical member. The optical member may include a glass substrate containing an upper surface and a lower surface facing each other in a thickness direction and overlapping the plurality of light emitting units in a plan view, and a quantum dot layer disposed directly on the upper surface or the lower surface and converting the first color light into a second color light and a third color light.

Display device

A display apparatus including a first base substrate, a second base substrate facing the first base substrate, and a liquid crystal layer disposed between the first base substrate and the second base substrate. In a peripheral area, which is a non-display area adjacent to the display area, the display apparatus includes a gate driving thin film transistor disposed on a first base substrate, a light blocking pattern disposed on the second base substrate and overlapping the gate driving thin film transistor, a blue light blocking pattern disposed on the light blocking pattern, and a blue light passing pattern disposed on the blue light blocking pattern.

Display apparatus and method of manufacturing the same

An optical modifier may include a color controller including quantum dots, a barrier layer encapsulating the color controller, and a low refractive layer spaced apart from the color controller with the barrier layer interposed between the color controller and the barrier layer. The barrier layer may have a layer density ranging from 1.50 g/cm3 to 3.0 g/cm3.

Optical modifier and display device including the same

A backlight unit may include a light source, a light guide plate configured to guide light emitted from the light source, a light conversion layer on the light guide plate, and a reflective pattern layer between the light guide plate and the light conversion layer, the reflective pattern layer including a plurality of holes. The light conversion layer absorbs at least a portion of the light emitted from the light source at the first predetermined wavelength and generates light having a second predetermined wavelength different than the first predetermined wavelength. A reflective layer may reflect the light having the second predetermined wavelength toward a display panel.

Backlight unit and display device including the same

Disclosed herein is an apparatus for measuring residual stress, methods of measuring residual stress data and residual stress using the apparatus, and a recording medium for storing software of the residual stress measuring method. The present invention is advantageous for evaluation of a mechanical material property and is non-destructive. Further, the present invention is widely applied to fields ranging from a microscopic area, such as a thin film or micro device, to a large-sized structure, and is not influenced by a microstructure by controlling the range of an applied load. Further, the measuring apparatus of the present invention is minimized in its volume to be easily attached to an actual structure. Further, in the present invention, various attaching devices are employed, thus enabling the apparatus to be attached to various materials regardless of the size and type of object materials to measure residual stress. Further, the measuring apparatus of the present invention is horizontally movable, so there is no need to move an apparatus body itself so as to take measurements at several positions of several materials. Further, the present invention does not require separate measurements for correcting experimental constants at the time of analyzing measured data.

Apparatus for determining residual stress, method for determining residual stress data using it, residual stress determining method using it and recording medium thereof

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Seoul, South Korea

Dongil Son