Samsung Electronics Co., Ltd.

National Cancer Center

Seoul National University

Dongho Shin

Jeongdon Ihm

Tongsung Kim

Byunghoon Jeong

Junha Lee

Jungjune Park

Tae Hyun Kim

Jangwoo Lee

Youngmin Jo

Jindo Byun

Kyungtae Kang

Se Byeong Lee

Joo-Young Kim

Sangwook Park

Chiweon Yoon

Sun Young Kim

Kwang Chan Lee

Young Kyung Lim

Kyoungtae Kang

Dae Yong Kim

Dongyun Yeo

Youngeun Kim

Minji Park

Chang Seok Chae

Eun Hee Jeang

Dong-Seok Shin

Daehyun Lee

Ui-Jung Hwang

Kwan Ho Cho

Hojin Jeong

Ki Mun Kang

Kwanghyun Jo

Jeonghoon Park

Tae-Ho Kim

Haksoo Kim

Jaeman Son

Youngkyung Lim

Jonghwi Jeong

Youngil Kang

Jaesuk Kim

Chunghun Lee

Kyoung-mi Choi

The disclosure relates to a device for detecting therapeutic radiation based on an optical disk with solar cells. The radiation detecting device may include at least one optical disk formed of a water-equivalent material, disposed perpendicular to a first direction in which the radiation is incident, and converting the radiation into visible light; a solar cell disposed on one side of the at least one optical disk, converting the visible light into an electrical signal; and a processing module for collecting and processing the electrical signal outputted from the solar cell.

Device for detecting therapeutic radiation based on optical disk with solar cells

Disclosed is a plasma processing apparatus comprising a plasma electrode, an electrostatic chuck, and a diode board. The electrostatic chuck includes a microheater layer and a chuck electrode. The microheater layer includes an inner heater part and an outer heater part. The inner heater part includes a first inner heater in a first inner region that circumferentially surrounds a center of the microheater layer, and a second inner heater in a second inner region that circumferentially surrounds the first inner region. The outer heater part includes a first outer heater in a first outer region that circumferentially surrounds the second inner region, and a second outer heater in a second outer region that circumferentially surrounds the first outer region. A distance between centers of the first and second outer heaters is less than that between centers of the first and second inner heaters.

Plasma processing apparatus and semiconductor fabrication method using the same

An apparatus and method for ZQ calibration, including determining a strong driver circuit and a weak driver circuit, which are related to an input/output (I/O) circuit connected to a signal pin, at power-up of the I/O circuit; providing a ZQ calibration code related to a sweep code to one from among the strong driver circuit and the weak driver circuit according to ZQ calibration conditions; and providing a ZQ calibration code related to a fixed code to an unselected circuit, thereby adjusting a termination resistance of the signal pin.

Apparatuses and methods for ZQ calibration

Disclosed is an electronic device, which includes a direct voltage to direct voltage converter, and a controller that receives first current information, second current information, an input voltage, and a feedback voltage from the direct voltage to direct voltage converter, controls the direct voltage to direct voltage converter based on the input voltage in one of a first mode, a second mode, or a third mode, controls the direct voltage to direct voltage converter based on the first current information and an output voltage such that buck conversion is performed in the first mode and the second mode, and controls the direct voltage to direct voltage converter based on the second current information and the output voltage such that boost conversion is performed in the second mode and the third mode.

Electronic device performing direct voltage to direct voltage conversion converting an input voltage to a fixed output voltage and operating method of electronic device

An impedance calibration circuit includes a first code generation circuit connected to a first reference resistor, and configured to generate a first code for forming a resistance based on the first reference resistor, by using the first reference resistor; a second code generation circuit configured to form a resistance of a second reference resistor less than the resistance of the first reference resistor, based on the first code, and generate a second code by using the second reference resistor; and a target impedance code generation circuit configured to generate a target impedance code based on the first code, the second code, and a target impedance value, and form an impedance having the target impedance value in a termination driver connected to the impedance calibration circuit, based on the target impedance code.

Impedance calibration circuit and memory device including the same

A method of operating a system including a parameter monitoring circuit and a host, includes generating a first parameter applying a first code to a current parameter, wherein a first offset is applied to the first code; generating a first comparison result by comparing the first parameter with a reference parameter value; generating a second parameter applying a second code to the current parameter, wherein a second offset is applied to the second code; generating a second comparison result by comparing the second parameter with the reference parameter value; detecting an error in the current parameter, based on the first comparison result and the second comparison result; and providing a signal based on the error to the host.

Method of operating a system including a parameter monitoring circuit

The present invention relates to an in vivo radiation amount measuring instrument. An in vivo radiation amount measuring instrument according to the present invention comprises: a main body elongated along an in vivo inserting direction and capable of supplying a fluid; an expanding part having at least a portion thereof fixed or connected to the main body and capable of being expanded and contracted by means of the outflow/inflow of the fluid; and a radiation measuring part disposed on the expanding part and measuring the amount of surface radiation distribution on in vivo tissue which the expanding part contacts by expanding.

In vivo radiation amount measuring instrument using film dosimeter that undergoes shape change with expansion

A parameter monitoring circuit includes a code generation circuit configured to generate a first code, to which a first offset is applied, and a second code, to which a second offset is applied; a parameter adjustment circuit configured to generate a first parameter and a second parameter by respectively applying the first code and the second code to a current parameter; a comparator circuit configured to generate a first comparison result and a second comparison result, the first comparison result indicating a comparison result between the first parameter and a reference parameter value, and the second comparison result indicating a comparison result between the second parameter and the reference parameter value; and a parameter error detection circuit configured to detect an error in the current parameter, based on the first comparison result and the second comparison result.

Parameter monitoring circuit for detecting error of parameter, duty cycle correction circuit, and impedance calibration circuit

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Hwaseong-si, South Korea

Dongho Shin