Industrial Technology Research Institute

Allied Material Technology Corp.

Allied Material Corporation

Dong-Yuan Goang

Huang-Chung Cheng

Zon-Zer Yu

Ting-Chiang Hsieh

Dou-I Chen

Chich-Jung Wu

Tsai-Sheng Gao

Chen-Lung Kuo

Ren-Long Chu

Chun-hsia Chen

A structure of an organic light-emitting TFT LCD and the method for making the same are disclosed. The invention provides a glass substrate on which a TFT IC is formed. A metal layer forms the top layer of the TFT. Afterwards, a white light-emitting organic material layer is deposited thereon. A cover layer is then used to flatten the surface of the organic material layer. Finally, a photo mask pattern and a color filter plate are formed, completing the assembly of the TFT LCD.

Structure of organic light-emitting TFT LCD and method of making the same

Liquid crystal display (LCD) structures and methods for forming the same. The black matrix and the color filter layer of the LCD are moved from color filter substrate to TFT substrate to form a color filter on TFT (COT) structure. Besides, the spacers are composed of photoresist or color photoresist can be located on portions of areas covered by the black matrix to maximize the aperture ratio.

Liquid crystal display structures

A structure of an organic light-emitting material TFT display and the method for making the same are disclosed. The invention provides a glass substrate formed with a plurality of TFTs thereon. A metal layer is formed on top of the TFT's. Afterwards, a planarized film layer covers the TFTs and the metal layer. The planarized film layer is formed with an organic light-emitting material pattern layer with red, blue and green colors. The organic light-emitting material pattern layer is in alignment with the TFT pattern. A transparent conductive glass layer is formed on top of the light-emitting material pattern layer. Finally, a photo mask pattern fills the light-emitting material pattern layer to prevent the mixture of different colors.

Method for making a structure of organic light-emitting material TFT display

A structure of an organic light-emitting material TFT LCD and the method for making the same are disclosed. The invention provides a glass substrate formed with a plurality of TFT's thereon. A metal layer is formed on top of the TFT's. Afterwards, a planarized film layer covers the TFT's and the metal layer. The planarized film layer is formed with an organic light-emitting material pattern layer with red, blue and green colors. The organic light-emitting material pattern layer is in alignment with the TFT pattern. A transparent conductive glass layer is formed on top of the light-emitting material pattern layer. Finally, a photo mask pattern fills the light-emitting material pattern layer to prevent the mixture of different colors.

Structure of organic light-emitting material TFT LCD and the method for making the same

Liquid crystal display structures and methods of forming the same

The present invention discloses a photolithography process with a gas-phase pretreatment before the development of photoresist to increase the depth of focus (DOF) of an isolated-line pattern on a substrate. A photoresist layer is coated on a substrate by using spin-on technology. Then, an exposure process is performed on the photoresist layer through a reticle to transfer a pattern of the reticle to the photoresist layer. Additionally, a gas-phase pretreatment is performed on the photoresist layer before or after the exposure process to harden the surface of the photoresist layer. Finally, a developing process is performed to form a pattern on the substrate.

Photolithography process with gas-phase pretreatment

The present invention discloses an apparatus for photolithography process with phase-pretreatment. The apparatus comprises several chambers: a vapor prime chamber, a vacuum-bake chamber, a chill-plate chamber, a coater chamber and a stepper chamber. Further, an interface chamber is between the stepper chamber and the apparatus. These chambers are connected together to a track system. A base gas is introduced into one of these chambers to perform a gas-phase pretreatment. The concentration of the base gas can be controlled and the processing time of the pretreatment process is well controlled by operating the apparatus. As a photoresist layer is applied on a substrate, the photoresist layer is hardened in the base gas to increase the depth of focus in photolithography process.

Apparatus for photolithography process with gas-phase pretreatment

A method of fabricating an optical retardation film having single axis crystal. A polymer material such as polyvinyl alcohol, polystyrene, polycarbonate, or poly methylmethacrylate dissolved in an alkyl solvent forms a polymer solution. A coating of the solution is deposited on a glass substrate by means of a spin coater. The coated substrate is heated in an oven or a heating pad to dry the polymer film. The dried film separated from the glass substrate forms the optical retardation film.

Method of fabricating an optical retardation film

A non-specular reflecting surface for use in a Liquid Crystal Display is obtained by randomly embedding particles in a layer of a resin solution and then baking to hardness. The particles' sizes are approximately the same as the layer's thickness, so a randomly uneven surface is the result. The particles are most commonly, but not necessarily, commercially available plastic microspheres. If a photosensitive resin is selected, it may be shaped into a desired pattern without the need for a separate photoresist and etch step. When a high reflectance metal is deposited onto the resin surface it becomes an effective non-specular reflector.

Reflective surface for LCD and method for forming it

A liquid crystal display having improved contrast has been developed by providing a black matrix comprising two layers, a metallic underlayer and a top layer of resin in which particles of black pigment have been dispersed. Additionally, said resin is photosensitive so, after exposure to an image having the shape of the desired black matrix, it assumes the form of the black matrix after development. It is then used as a mask during the etching of the underlying metallic layer. The presence of the resin greatly reduces the reflectivity of the black matrix, thereby increasing the contrast level of the overall display, while the underlying metallic layer provides a solid base for it to rest on.

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Chung Li, Taiwan

Dong-Yuan Goang