Boe Technology Group Co., Ltd.

Ordos Yuansheng Optoelectronics Co., Ltd.

Ak Optics Technology Co., Ltd.

China Electronics Engineering Design Institute Co., Ltd.

S.y. Technology, Engineering & Construction Co., Ltd.

Dong Yan

Wei Wang

Peng Li

Bo Li

Xiaohua Zhang

Jianpeng Liu

Chengmin Li

Linzi Wang

Shuang Yin Liu

Hao Lei

Tang Zhang

Xiahong Bai

Hongda Jiao

Xiaochao Ma

Longmao Ye

Qun Zhang

Jiangbiao Wang

Xueli Qin

Chuanyan Li

Hongmei Xiao

Xinshang Zhang

A self-calibration apparatus and method for a real-time temperature measurement system of a MOCVD device belong to the technical field of semiconductor manufacturing. The apparatus comprises a MOCVD reactor chamber () and an optical detector (). The MOCVD reactor chamber () comprises an epitaxial wafer (). A detection window () is provided on the top of the MOCVD reactor chamber (). The optical detector () emits detection light beams whose wavelengths are respectively &#x3bb;and &#x3bb;toward the epitaxial wafer () through the detection window (). The detection light beams are reflected by the epitaxial wafer () to form reflected light beams which are detected by the optical detector (). In the method, points corresponding to the actual thermal radiation ratios are depicted on the theoretical thermal radiation ratio-temperature curve according to actual thermal radiation ratios, and values of the temperatures T corresponding to the points are substituted into formulas to obtain mand mrespectively. With the method and apparatus, self-calibration of the real-time temperature measurement system of a MOCVD device is realized, thus ensuring consistent and accurate measurements of a growth temperature of the epitaxial wafer.

Self-calibration apparatus and method for real-time temperature measurement system of MOCVD device

An apparatus and a method for online and real-time detection of a temperature of an epitaxial wafer () belong to the technical field of semiconductor detection. The apparatus comprises a MOCVD reaction chamber (), a light source (), a beam splitter (), a reference light detector (), a reflected light detector () and a data acquisition unit (). The method, on the basis of the apparatus, can obtain a thermal radiation attenuation factor caused by a coating of a reactor chamber window and a reflectance attenuation factor caused by the coating of the reactor chamber window for the epitaxial wafer (). The apparatus and method can eliminate influence of the coating of the reactor chamber window on an online and real-time temperature detection value, thereby improving the accuracy of the online and real-time temperature detection value.

Apparatus and method for online and real-time detection of temperature of epitaxial wafer

The present disclosure relates to compensating method for cell assembly. According to a deviation value of a key position of a measured array substrate, a compensation value of an exposure parameter of black matrix process of a color film substrate is calculated in real time by using historical measurement data of batches. The compensation value is fed back to a manufacturing apparatus in real time. The manufacturing apparatus corrects the key parameter of the apparatus timely according to the compensation value of the exposure parameter of the black matrix, to manufacture a color film substrate matching with the array substrate.

Compensating method and system for cell assembly

The present invention provides a production equipment monitoring method and system, and the method comprises: receiving production equipment alarm information; determining abnormal production equipment according to the production equipment alarm information, and determining a user group corresponding to the abnormal production equipment according to preset correspondence between production equipment and user group; and sending the production equipment alarm information to a user in the determined user group in a preset alarm manner. As a result, alarm information can be sent to the corresponding user(s) in the preset alarm manner the first time an abnormity in the production equipment is found, so as to notify related personnel to handle the abnormity timely and accurately.

Production equipment monitoring method and system

Growing community of inventors

Beijing, China

Dong Yan