Mando Corporation

Charm Engineering Co., Ltd.

Dong Wan Kim

Hong Yong Bhae

Kwan Goo Rha

Jung Hee Lee

Won Haeng Lee

Hyang Joo Lee

Chul Hee Jang

A steering apparatus for a vehicle according to the present disclosure includes: a controller configured to transmit steering control signals on the basis of a first input signal from a torque sensor configured to sense torque of a steering shaft and a second input signal from any one of a location sensor, a camera sensor, a distance sensor, a vehicle speed sensor, and a vehicle height sensor; a first steering power assist configured to generate steering force by rotating the steering shaft or supplement steering force of the steering shaft rotating forward or backward, using electric power in response to the steering control signal from the controller; and a second steering power assist configured to switch channels for working fluid, depending on forward or backward rotation of the steering shaft, and steer wheels by operating a tie rod or a knuckle using hydraulic pressure of the working fluid.

Steering apparatus for vehicle

The present invention provides a rack assist type electric power steering apparatus. The power steering apparatus includes: a ball nut coupled to a rack bar via balls to be rotated, and configured to cause the rack bar to slide; a bearing mounted on an outer peripheral surface of the ball nut so as to support rotation of the ball nut; and a support member coupled to at least one of a space between one side of an outer race of the bearing and a housing and a space between the other side of the outer race of the bearing and the housing so as to support the bearing.

Rack assist type electric power steering apparatus

Provided are a substrate supporting apparatus and a plasma etching apparatus having the same. There is provided a substrate supporting apparatus that can separately provide powers to a central region and an edge region by disposing an electrode supporting a substrate at the central region of the substrate supporting apparatus, and disposing an electrode receiving radio frequency (RF) power at the edge region of the substrate supporting apparatus. There is provided a substrate edge etching apparatus having the substrate supporting apparatus for removing layers or particles deposited in an edge region of a semiconductor substrate and preventing damage of a center region of the semiconductor substrate during an etching process of the substrate edge.

Apparatus for supporting substrate and plasma etching apparatus having the same

Growing community of inventors

Gyeonggi-do, South Korea

Dong Wan Kim