Semes Co., Ltd.

Dong Suk Kim

Jae Hyun Cho

Won Seok Lee

Ogsen Galstyan

Jong-Hwan An

Hyoungkyu Son

Hyeon Gyu Kim

Sung Je Kim

Min Keun Bae

Provided is a support unit included in an apparatus for treating a substrate using plasma and configured to support the substrate. The support unit may include a power supply rod connected to a high-frequency power supply; an electrode plate configured to receive power from the power supply rod; and a ground ring provided to surround the electrode plate when viewed from the top and including a ground ring to be grounded.

Support unit and apparatus for treating substrate

The inventive concept relates to a substrate support unit provided in an apparatus for treating a substrate using plasma. In an embodiment, the substrate support unit includes a dielectric plate on which the substrate is placed, a lower electrode that is disposed under the dielectric plate and that has a first diameter, a power supply rod that applies RF power to the lower electrode and has a second diameter, and a ground member disposed under the lower electrode and spaced apart from the lower electrode by a first gap by an insulating member, the ground member including a plate portion having a through-hole formed therein through which the power supply rod passes, in which the through-hole has a third diameter.

Substrate treating apparatus and substrate support unit

Growing community of inventors

Hwaseong-si, South Korea

Dong Suk Kim