Samsung Electronics Co., Ltd.

Dong-Seok Ham

Hyun-Joon Kim

Yo-Han Ahn

Hoo-Kun Lee

Tae-Ho Kim

Ji-Young Kim

Joo-Young Kim

Kun-Hyung Lee

Hyun-Ho Cho

Hyung-Seok Choi

Ju-A Ryu

Chang-Min Cho

Jae-Bong Kim

Kyoung-Ho Park

Hyeogi-Ki Kim

An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.

Air filtering device and cleaning system of semiconductor manufacturing apparatus with the same

In a fan filter unit for filtering and continuously supplying clean air into a clean room, the fan filter unit includes a chemical filter for removing chemical contaminants contained in the air, a fan for sucking and blowing out the air, and a particle filter for removing particles such as dusts and moisture contained in the air. A filter medium of the chemical filter has a circular tube shape and is disposed between an inner circular tube and an outer circular tube. A cover is detachably combined with top portions of the inner and the outer circular tubes, and prevents air flow through the top portions of the inner and outer circular tubes. The air is sucked only through the outer circular tube, the chemical filter and the inner circular tube by a suction force of the fan. Accordingly, velocity distribution of the air passing through the chemical filter may be improved and lifetime of the chemical filter may be increased.

Chemical filter and fan filter unit having the same

A chemical filter medium for removing ozone and nitrogen oxide includes a first ozone absorption layer for mainly removing ozone having a filtering base material for removing ozone, a first nitrogen oxide absorption layer for mainly removing nitrogen oxide formed on the first ozone absorption layer that includes a filtering base material for removing nitrogen oxide, and a second ozone absorption layer formed on the first nitrogen oxide absorption layer that includes a filtering base material for removing ozone. The chemical filter medium can simultaneously remove ozone and nitrogen oxide.

Chemical filter medium, chemical filter including the chemical filter medium and method for manufacturing the chemical filter

A module for transferring a substrate includes a load port for supporting a container to receive a plurality of substrates, a substrate transfer chamber disposed between the load port and a substrate process module, a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrates between the container and the substrate process module, a gas supply unit connected to the substrate transfer chamber for supplying a purge gas into the substrate transfer chamber to purge an interior of the substrate transfer chamber, and a contamination control unit connected to the substrate transfer chamber for circulating the purge gas supplied into the substrate transfer chamber, resupplying the circulated purge gas into the substrate transfer chamber and removing particles and airborne molecular contaminants from the purge gas being circulated. Contamination of a substrate may be prevented and a necessary amount of purge gas may be reduced.

Module for transferring a substrate

A contamination control apparatus has a sprayer including at least one nozzle for spraying water, at least one eliminator having a passageway in which air is sprayed with the water to remove potential contaminants from the air, and a circulator for providing the sprayer with the water. The circulator includes a pH control device for adjusting the pH of the water fed to the sprayer, and an organic matter removing device for removing organic matter from the water. The contamination control apparatus can be advantageously employed in an air-conditioning system of a substrate processing facility.

Contamination control method and apparatus, and air-conditioning system of a substrate processing facility employing the same

A cassette table on which a wafer cassette is supported allows static electricity to be discharged from the cassette and hence, form the wafers disposed in the cassette. The cassette table includes a top plate, a cassette supporter that is mounted on the top plate and supports the cassette. At least part of the cassette supporter is made of a material that allows static electricity to be discharged to ground therethrough.

Cassette table of a semiconductor fabricating apparatus

An air-sampling carrier for sampling air from a clean room of a semiconductor processing facility, an apparatus and a method for analyzing the air, wherein the air-sampling carrier includes a container having an inner space, a door mounted at a front wall of the container, a discharging pipe for discharging the air sample out of the container, and at least one inlet tube for introducing purge gas into the inner space of the container from outside the container. The discharging pipe and inlet tube are respectively formed on an outer surface of the container and connected to an inner space of the container. The air in the unit process tools is effectively sampled using an unmanned carrying apparatus and the pollution level of the air sample is simply and easily measured.

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Gyeonggi-do, South Korea

Dong-Seok Ham