Lg Chem, Ltd

Lf Chem, Ltd.

Dong Kung Oh

Sung Hyun Kim

Keon Woo Lee

Chang Soon Lee

Sang Kyu Kwak

Chang Ho Cho

Raisa Kharbash

Kyoung Hoon Min

Chang Hyun Cho

Jeong Ae Yoon

Han Soo Kim

Bog Ki Hong

Min Young Lim

Seung Hee Lee

Kyung Jun Kim

Jong Hyun Park

Won Jin Chung

Geun Young Cha

Beom Su Park

Dong Chang Choi

Jong Hwi Hwang

Xiang Li Li

Il Eok Kwon

Hee Kwan Park

A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film.

Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition

A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.

Composition for simultaneously forming two isolated column spacer patterns

A color filter substrate is provided. In the color filter substrate, transparent protective films are formed on respective sub-pixels of a color filter. The color filter substrate has improved electric field characteristics without the need for additional optical or circuit compensation to achieve an improvement in contrast and a reduction in color difference.

Color filter substrate

A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1:  The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.

Photoactive compound and photosensitive resin composition comprising the same

A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2:   Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.

Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same

The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, Rand R, R, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.

Photoactive compound and photosensitive resin composition containing the same

The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester group and a triazine group in one molecule and thus effectively absorbs UV radiation. Therefore, the photosensitive composition according to the present invention is advantageous not only in curing of materials for color filters, resin black matrixes, column spacers, overcoats and passivation films of liquid crystal displays, but also in high temperature process characteristics.

Photosensitive composition comprising triazine-based photoactive compound containing oxime ester

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Daejeon, South Korea

Dong Kung Oh