Rohm and Haas Electronic Materials Korea Ltd.

Dong-Je Hong

Jihoon Kang

Hyun Bae Jeon

Eui-Hyun Ryu

Chang-Young Hong

Dong-Yong Kim

Min-Kyung Jang

Myung Yeol Kim

Hae-Jin Lim

Sun-Jung Lee

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a surface agent of the Formula (I). where A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. Preferred coating compositions can provide improved pattern collapse margin of an overcoated photoresist layer.

Coating compositions for use with an overcoated photoresist

New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.

Photoresist compositions and methods

Growing community of inventors

Gyeonggi-do, South Korea

Dong-Je Hong