Samsung Electronics Co., Ltd.

Seoul National University

Dong-Hwa Shin

Sang-Ho Lee

Byong-Cheol Park

Seung-Ki Chae

Sung-Wook Park

Jin-Sung Lee

Dong-Woo Lee

Tae-Gyu Kim

Young-Min Ko

Hyun-Joo Song

Sang-Kap Kim

Jin-Wook Seo

Myoung-Su Cho

Mee-Sun Song

Jin-Phil Choi

Heon-Jin Park

An electronic device and a method of displaying an object are provided. The method of displaying an object includes displaying a plurality of objects on a screen, determining a plurality of objects corresponding to a selected item in accordance with selection of the item based on which the plurality of objects is classified, and displaying the plurality of determined objects on the screen.

Electronic device and method of displaying object

Provided are methods and apparatus for exposing multiple substrates within a single exposing apparatus using only a single light source wherein a first substrate is exposed in a series of steps or shots during which light transmitted along a primary optical path is directed onto a primary surface of the substrate with the substrate being repositioned between sequential shots. A second substrate is exposed during the period of time while the first substrate is being repositioned by altering the optical path to divert the light from the light source into a secondary optical path that will expose a region on the second substrate. When the first substrate has been repositioned, the diversion of the light is terminated so that the light will again be transmitted along the primary optical path in order to expose the next sequential shot on the primary surface of the first substrate.

Method and apparatus for exposing semiconductor substrates

A method of exposing a wafer to a light comprises transferring an image onto a plurality of shot areas by irradiating a projection light, each of the plurality of shot areas including at least one die area defined on the wafer on which a photoresist film is formed, and scanning the at least one die area adjacent to an edge portion of the wafer by irradiating a scanning light.

Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same

A temperature controller for a semiconductor-fabricating tool includes a Peltier element disposed on an outer wall of the semiconductor-fabricating tool, and a battery for providing a current to the Peltier element. The Peltier element a heat-emitting plate for emitting heat by the current provided thereto, and a heat-absorbing plate for absorbing a heat. A first temperature sensor senses a temperature of the Peltier element. A second temperature sensor senses an interior temperature of the semiconductor-fabricating tool. A controller controls an amount of the current provided to the Peltier element in accordance with a temperature of the Peltier element sensed by the first temperature sensor and an interior temperature of the semiconductor-fabricating tool sensed by the second temperature sensor.

Temperature controller for a semiconductor-fabricating tool

A wafer bake system includes a heating plate for heating a wafer, and means for supporting the wafer to be spaced from the heating plate, wherein a gap distribution between the wafer and the heating plate is measured, and a temperature gradient of the wafer is controlled based on the measured gap distribution.

Wafer bake system and method for operating the same

A device is for recovering superfluous photoresist material exhausted from a spin coater having a drive motor alternately operated at a high speed and a low speed at predetermined intervals. The device includes a solution collecting member into which superfluous photoresist material and cleaning solution are collected after a photoresist is coated onto a wafer and the wafer is cleaned during operation of the drive motor. The solution collecting member has a groove circumferentially formed therein to allow the superfluous photoresist material to flow therein. First and second discharge pipes communicate with the solution collecting member to drain the superfluous photoresist material and a cleaning solution and a third discharging pipe communicates with the groove formed in the solution collecting member. An actuator is provided to move a blocking member between an open position and closed position to open and close the groove.

Device for recovering photoresist material exhausted from a spin coater

Growing community of inventors

Suwon-si, South Korea

Dong-Hwa Shin