Samsung Electronics Co., Ltd.

Dong-Hwa Kwak

Tae-Yong Kim

Young-Woo Park

Jae-Kwan Park

Dong-Sik Lee

Jee-Hoon Han

Jang-Hyun You

Jong-Hoon Na

Yoo-Sang Hwang

Tae-Young Chung

Su-Jin Park

Byung-jun Hwang

Nam-su Lim

So-wi Jin

Jang-ho Park

Byung-Seo Kim

Jong-Min Lee

Sang-Yong Park

Byung-Kwan You

A semiconductor device includes first, second, and third conductive lines, each with a respective line portion formed over a substrate and extending in a first direction and with a respective branch portion extending from an end of the respective line portion in a direction different from the first direction. The branch portion of a middle conductive line is disposed between and shorter than the respective branch portions of the outer conductive lines such that contact pads may be formed integral with such branch portions of the conductive lines.

Semiconductor device and method of fabricating the same

A NAND flash memory device includes a plurality of continuous conductors disposed on a common level of a multilayer substrate, the plurality of continuous conductors including respective conductive lines extending in parallel along a first direction, respective contact pads disposed at ends of the respective conductive lines and respective conductive dummy lines extending in parallel from the contact pads along a second direction.

Methods of manufacturing NAND flash memory devices

Semiconductor devices having wiring with contact pads and dummy lines

A method of fabricating a nonvolatile memory device includes providing a substrate having active regions defined by a plurality of trenches, forming a first isolation layer on the substrate having the plurality of trenches, forming a sacrificial layer on the first isolation layer to fill the trenches, the sacrificial layer including a first region filling lower portions of the trenches and a second region filling portions other than the lower portions, removing the second region of the sacrificial layer, forming a second isolation layer on the first isolation layer and the first region of the sacrificial layer, forming air gaps in the trenches by removing the first region of the sacrificial layer, and removing a portion of the first isolation layer and a portion of the second isolation layer while maintaining the air gaps.

NAND flash memory device

Method of fabricating a nonvolatile memory device

A method in the fabrication of a semiconductor device simultaneously forms different patterns on the same level of the device. The device has a first area and a second area. A low density mask pattern of at least one relatively wide topographic feature is formed on the second area, a plurality of relatively narrow topographic features is formed on the first area, first spacers are formed on side walls of the narrow topographic features in the first area, the relatively narrow topographic features are removed, and the patterns of the first spacers and the relatively wide topographic feature(s) are simultaneously transcribed in the first and second areas, respectively.

Method of forming patterns of semiconductor device

A semiconductor device having resistors in a peripheral area and fabrication method thereof are provided. A mold layer is formed on a semiconductor substrate. The mold layer is patterned to form first molding holes and a second molding hole in the mold layer. A storage node layer is formed on the mold layer as well as in the first and second molding holes. The storage node layer is patterned to form storage nodes in the first molding holes and a portion of a resistor in the second hole.

Semiconductor memory device having resistor and method of fabricating the same

A method of fabricating a semiconductor device having a cell array area and a peripheral circuit area is provided. A mold layer is formed on a substrate in the cell array area and the peripheral circuit area. A plurality of first molding holes are formed in the mold layer in the cell array area. A second molding hole is formed in the mold layer in the peripheral circuit area. A storage node layer is formed on the mold layer, in the first molding holes and in the second molding hole. A plurality of storage nodes are formed in the first molding holes and a first portion of a resistor is formed in the second molding hole by removing a portion of the storage node layer. The first portion of the resistor is formed of the storage node layer.

Method of fabricating a semiconductor memory device having resistor

A semiconductor device and a method for making a semiconductor device having a pillar-shaped capacitor storage node compatible with a high dielectric film, wherein the pillar shaped capacitor storage node includes a thick conductive metal layer that is easily etched and a thin conductive layer completely coating the thick conductive metal layer. The thin conductive layer protects the thick conductive metal layer during subsequent high dielectric deposition and annealing and various oxidation process.

Semiconductor device with pillar-shaped capacitor storage node

A semiconductor device and a method for making a semiconductor device having a pillar-shaped capacitor storage node compatible with a high dielectric film, wherein the pillar-shaped capacitor storage node includes a thick conductive metal layer that is easily etched and a thin conductive layer completely coating the thick conductive metal layer. The thin conductive layer protects the thick conductive metal layer during subsequent high dielectric deposition and annealing and various oxidation process.

Growing community of inventors

Suwon-si, South Korea

Dong-Hwa Kwak