Samsung Electronics Co., Ltd.

Dong-ho Kim

Woung-kwan An

Hun Cha

Byung-kwan Lee

Choung-hyep Kim

Seung-ug Kim

Chul-hui Kim

Guk-hyeong Cho

Kyoon-hee Goh

Young-chul Jeong

In-hyub Park

A development system for manufacturing semiconductor devices uses a container to easily remove by-products of development from a wafer by: soaking the wafer in the developer with the pattern face downward; spraying rinse onto the pattern face from below; rotating the wafer at high speed to remove the rinse and by-products; and then cleaning and ventilating the container so that the developer, rinse, cleaning solution and development by-products are removed from the container. No by-products are left in the comers of the pattern of the pattern face, because the development and rinse are performed with the pattern facing downward. No by-products, developer, rinse or cleaning solution contaminate the wafer, because steps of the process are performed in an enclosed container which is cleaned and ventilated between development of each wafer.

Development system for manufacturing semiconductor devices, including a

A UV irradiation apparatus, which includes a UV lamp installed in a chamber for generating UV rays; a vacuum chuck installed below the UV lamp for supporting and moving a wafer; and, a reflector surrounding the UV lamp for concentrating UV rays on the vacuum chuck. The apparatus further includes heating blocks for controlling the temperature at both sides of the vacuum chuck. Thus, it is possible to maintain an essentially constant temperature around the wafer supported by the vacuum chuck. As a result of the temperature control, when a protection tape attached to the front side of the wafer is irradiated with UV rays, an adhesive of the protective tape can be effectively degraded by a chemically reaction under optimum conditions, to thereby easily detach the protection tape from the wafer.

UV irradiation apparatus

A wafer holder is provided which more stably supports a transferred wafer and prevents interference between a wafer stopper and other elements of the wafer holder. The wafer holder includes a wafer guiding section having a centrally and inwardly inclined surface for stably guiding a wafer, a wafer support section formed at an inner side of the wafer guiding section and having a wider width for more stably supporting the wafer, and a pair of spaced-apart rectangular wafer stopper holes formed between the wafer guiding section and the wafer support section, and having a predetermined size that is wider in the circumferential direction of the wafer support section than in the radial direction. The wafer holder acts to prevent interference between the wafer stopper and other elements when the wafer stopper and the arm move up and down.

Wafer holder

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Kyungki-do, South Korea

Dong-ho Kim