Lg Philips Lcd Co., Inc.

Dong Hee Kim

Kyo Ho Moon

A thin film transistor and a fabricating method thereof are adaptive for increasing a capacitance of a storage capacitor. In the method, a gate electrode and a lower electrode of a capacitor are formed at the transistor area and the capacitor area of an insulating substrate, respectively. A gate insulating film, an active layer and an ohmic contact layer on the insulating substrate is sequentially formed to cover the gate electrode and the lower electrode. The ohmic contact layer and the active layer are primarily patterned in such a manner as to be left only at a portion corresponding to the gate electrode of the transistor area and thus expose the gate insulating film. Then, the ohmic contact layer and the active layer are secondarily patterned in such a manner as to reduce the thickness of the gate insulating film at a portion corresponding to the lower electrode. The source and drain electrodes are formed on the gate insulating film at the transistor area, and an upper electrode of the capacitor is formed at a portion corresponding to the lower electrode on the gate insulating insulating film of the capacitor.

Thin film transistor and fabricating method thereof

A thin film transistor and a fabricating method thereof are adaptive for increasing a capacitance of a storage capacitor. In the method, a gate electrode and a lower electrode of a capacitor are formed at the transistor area and the capacitor area of an insulating substrate, respectively. A gate insulating film, an active layer and an ohmic contact layer on the insulating substrate is sequentially formed to cover the gate electrode and the lower electrode. The ohmic contact layer and the active layer are primarily patterned in such a manner as to be left only at a portion corresponding to the gate electrode of the transistor area and thus expose the gate insulating film. Then, the ohmic contact layer and the active layer are secondarily patterned in such a manner as to reduce the thickness of the gate insulating film at a portion corresponding to the lower electrode. The source and drain electrodes are formed on the gate insulating film at the transistor area, and an upper electrode of the capacitor is formed at a portion corresponding to the lower electrode on the gate insulating film of the capacitor.

Growing community of inventors

Daegu, South Korea

Dong Hee Kim