Korea Kumho Petrochemical Co., Ltd.

Dong Chul Seo

Jin Bong Shin

Joo Hyeon Park

Seong Ju Kim

Hyun Sang Joo

Jung Hoon Oh

Dae Kyung Yoon

Joon Hee Han

Dae Hyeon Shin

Tae Gon Kim

Hyun Soon Lim

Sun Yi Park

Provided are an additive for resist represented by the following formula (1), and a resist composition containing the additive. The additive according to the present invention can suppress leaching caused by water during an immersion lithographic process by increasing hydrophobicity of the surface of the resist film in the exposure at the time of applying the additive to a resist composition, and can form a fine resist pattern having excellent sensitivity and resolution at the time of applying the additive to a resist composition. wherein the substituents respectively have the same meanings as defined above.

Additive for resist and resist composition comprising same

A sulfonium compound represented by formula (1), a photo-acid generator, and a method for producing a sulfonium compound are provided: wherein X represents an electron-donating group; Rand Reach represent an alkyl group, a cycloalkyl group, or the like; Rand Reach represent an arylene group or a heteroarylene group; Rand Reach represent an alkyl group, a cycloalkyl group, or the like; and Aand Bare anions that are different from each other. The sulfonium compound, when used as a photo-acid generator, can produce a uniform and excellent resist pattern.

Sulfonium compound, photo-acid generator, and method for manufacturing the same

A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, Y, X, R, R, n, nand Ahave the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

Photoacid generator, method for producing the same, and resist composition comprising the same

Chemically amplified resist composition containing norbornane type low molecular additive

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Chungcheongnam-do, South Korea

Dong Chul Seo