Lg Chem, Ltd

Lf Chem, Ltd.

Dong Chang Choi

Geun Young Cha

Sung Hyun Kim

Han Soo Kim

Min Young Lim

Kyung Soo Choi

Ho Chan Ji

Jeong Ae Yoon

Sung-Hyun Kim

Jae Jin Kim

Sang Choll Han

Eun Joo Choi

Keon Woo Lee

Kyung Jun Kim

Dae Han Seo

Jong Hyun Park

Min Soo Song

Yoon Hee Heo

Dong Kung Oh

Kwang Han Park

Chang Ho Cho

Sun Hwa Kim

Ji Heum Yoo

Il Eok Kwon

Xiang Li Li

Hee Kwan Park

The present invention relates to a photomask and a method for manufacturing a column spacer for a color filter using the same, and according to one aspect of the present invention, a photomask is provided, which comprises a central region having a first transmittance, a first perimeter region surrounding the central region and having a second transmittance lower than the first transmittance, and a second perimeter region surrounding the first perimeter region and having the first transmittance.

Photomask and method for manufacturing column spacer for color filter using the same

A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159&#xb0; C., 55-90 weight % of a second solvent having a boiling point of 160-200&#xb0; C., and 3-15 weight % of a third solvent having a boiling point of 201-280&#xb0; C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.

Photosensitive resin composition for black matrix

Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.

Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same

The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester group and a triazine group in one molecule and thus effectively absorbs UV radiation. Therefore, the photosensitive composition according to the present invention is advantageous not only in curing of materials for color filters, resin black matrixes, column spacers, overcoats and passivation films of liquid crystal displays, but also in high temperature process characteristics.

Photosensitive composition comprising triazine-based photoactive compound containing oxime ester

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Daejeon, South Korea

Dong Chang Choi