University of Pennsylvania

Other

Gelest, Inc.

Donald H Berry

Barry C Arkles

Jorge J Santiago-Aviles

Lisa Kiernan Figge

Peter I Djurovich

Silsesquioxane polymers that are useful for preparing SiO -rich ceramic coatings are obtained as the polymeric reaction products from the hydrolysis and condensation of organosilanes having a &bgr;-substituted alkyl group. A preferred silsesquioxane polymer is the polymeric reaction product obtained from &bgr;-chloroethyltrichlorosilane. More preferred silsesquioxones are those with non-halogenated alkyl groups, such as the &bgr;-acetoxyethyl- and &bgr;-hydroxyethyl-silsesquioxones. Coating compositions containing such silsesquioxane polymers dissolved in organic solvent may be applied to a substrate and converted to SiO -rich ceramic thin layers by evaporating the solvent and heating the coated substrate at moderate temperatures.

&bgr;-substituted organosilsesquioxane polymers

Silsesquioxane polymers that are useful for preparing SiO.sub.2 -rich ceramic coatings are obtained as the polymeric reaction products from the hydrolysis and condensation of organosilanes having a .beta.-substituted alkyl group. A preferred silsesquioxane polymer is the polymeric reaction product obtained from .beta.-chloroethyltrichlorosilane. Coating compositions containing such silsesquioxane polymers dissolved in organic solvent may be applied to a substrate and converted to SiO.sub.2 -rich ceramic thin layers by evaporating the solvent and heating the coated substrate at moderate temperatures.

Method of using siloxane polymers

An improved method for synthesizing arylsilanes is disclosed. Novel catalysts for use in the method are provided. A method for synthesizing the novel catalysts is also disclosed.

Method of synthesizing arylsilanes

An organometallic precursor mixture is formed containing desired components of a final ceramic. This precursor mixture is dissolved in an organic solvent. The dissolved mixture is then spin cast or otherwise evenly deposited onto a wafer substrate. Finally, the coated wafer substrate is annealed by a process of Rapid Thermal Annealing to produce a thin ceramic film and to remove any organic material. This process exhibits preferential crystal growth to produce a uniform thin film.

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Dresher, PA, United States of America

Donald H Berry